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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 10 — May. 20, 2013
  • pp: 11747–11756

Ion beam lithography for Fresnel zone plates in X-ray microscopy

Kahraman Keskinbora, Corinne Grévent, Michael Bechtel, Markus Weigand, Eberhard Goering, Achim Nadzeyka, Lloyd Peto, Stefan Rehbein, Gerd Schneider, Rolf Follath, Joan Vila-Comamala, Hanfei Yan, and Gisela Schütz  »View Author Affiliations

Optics Express, Vol. 21, Issue 10, pp. 11747-11756 (2013)

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Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL). Here, we show that ion beam lithography (IBL) may advantageously simplify their preparation. A FZP operable from the extreme UV to the limit of the hard X-ray was prepared and tested from 450 eV to 1500 eV. The trapezoidal profile of the FZP favorably activates its 2nd order focus. The FZP with an outermost zone width of 100 nm allows the visualization of features down to 61, 31 and 21 nm in the 1st, 2nd and 3rd order focus respectively. Measured efficiencies in the 1st and 2nd order of diffraction reach the theoretical predictions.

© 2013 OSA

OCIS Codes
(180.5810) Microscopy : Scanning microscopy
(180.7460) Microscopy : X-ray microscopy
(340.0340) X-ray optics : X-ray optics
(340.6720) X-ray optics : Synchrotron radiation
(340.7460) X-ray optics : X-ray microscopy
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(050.1965) Diffraction and gratings : Diffractive lenses

ToC Category:

Original Manuscript: January 29, 2013
Revised Manuscript: April 15, 2013
Manuscript Accepted: April 17, 2013
Published: May 7, 2013

Virtual Issues
Vol. 8, Iss. 6 Virtual Journal for Biomedical Optics

Kahraman Keskinbora, Corinne Grévent, Michael Bechtel, Markus Weigand, Eberhard Goering, Achim Nadzeyka, Lloyd Peto, Stefan Rehbein, Gerd Schneider, Rolf Follath, Joan Vila-Comamala, Hanfei Yan, and Gisela Schütz, "Ion beam lithography for Fresnel zone plates in X-ray microscopy," Opt. Express 21, 11747-11756 (2013)

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