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Energy Express

Energy Express

  • Editor: Christian Seassal
  • Vol. 21, Iss. S4 — Jul. 1, 2013
  • pp: A631–A641

Fabrication of resonant patterns using thermal nano-imprint lithography for thin-film photovoltaic applications

Tanzina Khaleque, Halldor Gudfinnur Svavarsson, and Robert Magnusson  »View Author Affiliations


Optics Express, Vol. 21, Issue S4, pp. A631-A641 (2013)
http://dx.doi.org/10.1364/OE.21.00A631


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Abstract

A single-step, low-cost fabrication method to generate resonant nano-grating patterns on poly-methyl-methacrylate (PMMA; plexiglas) substrates using thermal nano-imprint lithography is reported. A guided-mode resonant structure is obtained by subsequent deposition of thin films of transparent conductive oxide and amorphous silicon on the imprinted area. Referenced to equivalent planar structures, around 25% and 45% integrated optical absorbance enhancement is observed over the 450-nm to 900-nm wavelength range in one- and two-dimensional patterned samples, respectively. The fabricated elements provided have 300-nm periods. Thermally imprinted thermoplastic substrates hold potential for low-cost fabrication of nano-patterned thin-film solar cells for efficient light management.

© 2013 OSA

OCIS Codes
(230.7370) Optical devices : Waveguides
(310.1860) Thin films : Deposition and fabrication
(310.2790) Thin films : Guided waves
(350.6050) Other areas of optics : Solar energy
(110.4235) Imaging systems : Nanolithography
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Photovoltaics

History
Original Manuscript: April 15, 2013
Revised Manuscript: May 17, 2013
Manuscript Accepted: May 18, 2013
Published: May 23, 2013

Citation
Tanzina Khaleque, Halldor Gudfinnur Svavarsson, and Robert Magnusson, "Fabrication of resonant patterns using thermal nano-imprint lithography for thin-film photovoltaic applications," Opt. Express 21, A631-A641 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-S4-A631


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