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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 12 — Jun. 17, 2013
  • pp: 14399–14408

Enhancement of the reflectivity of Al/Zr multilayers by a novel structure

Qi Zhong, Zhong Zhang, Runze Qi, Jia Li, Zhanshan Wang, Karine Le Guen, Jean-Michel André, and Philippe Jonnard  »View Author Affiliations


Optics Express, Vol. 21, Issue 12, pp. 14399-14408 (2013)
http://dx.doi.org/10.1364/OE.21.014399


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Abstract

The reflectivity of Al/Zr multilayers is enhanced by the use of a novel structure. The Al layers are divided by insertion of Si layers. In addition, Si barrier layers are inserted at the Al/Zr interfaces (Zr-on-Al and Al-on-Zr). As a result, crystallization of the Al layer is inhibited and that of Zr is enhanced. In grazing incidence x-ray reflectometry, x-ray diffraction, and extreme ultraviolet measurements, the novel multilayers exhibit lower interfacial roughness compared with traditional multilayer structures, and their reflectivity is increased from 48.2% to 50.0% at a 5° angle of incidence. These novel multilayers also have potential applications in other multilayer systems and the semiconductor industry.

© 2013 OSA

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

History
Original Manuscript: April 9, 2013
Revised Manuscript: May 16, 2013
Manuscript Accepted: May 28, 2013
Published: June 10, 2013

Citation
Qi Zhong, Zhong Zhang, Runze Qi, Jia Li, Zhanshan Wang, Karine Le Guen, Jean-Michel André, and Philippe Jonnard, "Enhancement of the reflectivity of Al/Zr multilayers by a novel structure," Opt. Express 21, 14399-14408 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-12-14399


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References

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