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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 12 — Jun. 17, 2013
  • pp: 14763–14770

Enhanced refractive index sensitivity of elevated short-range ordered nanohole arrays in optically thin plasmonic Au films

Vladimir E. Bochenkov, Maj Frederiksen, and Duncan S. Sutherland  »View Author Affiliations

Optics Express, Vol. 21, Issue 12, pp. 14763-14770 (2013)

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A simple development of the colloidal lithography technique is demonstrated for fabrication of perforated plasmonic metal films elevated above the substrate surface. The bulk refractive index sensitivity of short-range ordered nanohole arrays in 20 nm thick Au films exhibits an increase of up to 37% due to reduction of substrate effect caused by lifting with a 40 nm silica layer. Analysis of the local electric field distribution suggests that the sensitivity increase is due to revealing of the enhanced field near the holes.

© 2013 OSA

OCIS Codes
(130.6010) Integrated optics : Sensors
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics
(250.5403) Optoelectronics : Plasmonics
(310.6845) Thin films : Thin film devices and applications

ToC Category:

Original Manuscript: May 16, 2013
Revised Manuscript: June 4, 2013
Manuscript Accepted: June 7, 2013
Published: June 13, 2013

Vladimir E. Bochenkov, Maj Frederiksen, and Duncan S. Sutherland, "Enhanced refractive index sensitivity of elevated short-range ordered nanohole arrays in optically thin plasmonic Au films," Opt. Express 21, 14763-14770 (2013)

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