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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 12 — Jun. 17, 2013
  • pp: 14867–14875

Nanosecond pulsed laser damage characteristics of HfO2/SiO2 high reflection coatings irradiated from crystal-film interface

Xinbin Cheng, Hongfei Jiao, Jiangtao Lu, Bin Ma, and Zhanshan Wang  »View Author Affiliations

Optics Express, Vol. 21, Issue 12, pp. 14867-14875 (2013)

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The nano-precursors in the subsurface of Nd:YLF crystal were limiting factor that decreased the laser-induced damage threshold (LIDT) of HfO2/SiO2 high reflection (HR) coatings irradiated from crystal-film interface. To investigate the contribution of electric-field (E-field) to laser damage originating from nano-precursors and then to probe the distribution of vulnerable nano-precursors in the direction of subsurface depth, two 1064 nm HfO2/SiO2 HR coatings having different standing-wave (SW) E-field distributions in subsurface of Nd:YLF c5424181043036123rystal were designed and prepared. Artificial gold nano-particles were implanted into the crystal-film interface prior to deposition of HR coatings to study the damage behaviors in a more reliable way. The damage test results revealed that the SW E-field rather than the travelling-wave (TW) E-field contributed to laser damage. By comparing the SW E-field distributions and LIDTs of two HR coating designs, the most vulnerable nano-precursors were determined to be concentrated in a thin redeposition layer that is within 100 nm from the crystal-film interface.

© 2013 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.3440) Lasers and laser optics : Laser-induced breakdown
(310.1620) Thin films : Interference coatings

ToC Category:
Lasers and Laser Optics

Original Manuscript: May 10, 2013
Revised Manuscript: June 9, 2013
Manuscript Accepted: June 10, 2013
Published: June 14, 2013

Xinbin Cheng, Hongfei Jiao, Jiangtao Lu, Bin Ma, and Zhanshan Wang, "Nanosecond pulsed laser damage characteristics of HfO2/SiO2 high reflection coatings irradiated from crystal-film interface," Opt. Express 21, 14867-14875 (2013)

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