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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 13 — Jul. 1, 2013
  • pp: 15382–15388

Investigation of ablation thresholds of optical materials using 1-µm-focusing beam at hard X-ray free electron laser

Takahisa Koyama, Hirokatsu Yumoto, Yasunori Senba, Kensuke Tono, Takahiro Sato, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Hidekazu Mimura, Makina Yabashi, Kazuto Yamauchi, Haruhiko Ohashi, and Tetsuya Ishikawa  »View Author Affiliations


Optics Express, Vol. 21, Issue 13, pp. 15382-15388 (2013)
http://dx.doi.org/10.1364/OE.21.015382


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Abstract

We evaluated the ablation thresholds of optical materials by using hard X-ray free electron laser. A 1-µm-focused beam with 10-keV of photon energy from SPring-8 Angstrom Compact free electron LAser (SACLA) was irradiated onto silicon and SiO2 substrates, as well as the platinum and rhodium thin films on these substrates, which are widely used for optical materials such as X-ray mirrors. We designed and installed a dedicated experimental chamber for the irradiation experiments. For the silicon substrate irradiated at a high fluence, we observed strong mechanical cracking at the surface and a deep ablation hole with a straight side wall. We confirmed that the ablation thresholds of uncoated silicon and SiO2 substrates agree with the melting doses of these materials, while those of the substrates under the metal coating layer are significantly reduced. The ablation thresholds obtained here are useful criteria in designing optics for hard X-ray free electron lasers.

© 2013 OSA

OCIS Codes
(140.2600) Lasers and laser optics : Free-electron lasers (FELs)
(160.4670) Materials : Optical materials
(340.0340) X-ray optics : X-ray optics

ToC Category:
Materials

History
Original Manuscript: March 29, 2013
Revised Manuscript: May 22, 2013
Manuscript Accepted: May 22, 2013
Published: June 20, 2013

Citation
Takahisa Koyama, Hirokatsu Yumoto, Yasunori Senba, Kensuke Tono, Takahiro Sato, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Hidekazu Mimura, Makina Yabashi, Kazuto Yamauchi, Haruhiko Ohashi, and Tetsuya Ishikawa, "Investigation of ablation thresholds of optical materials using 1-µm-focusing beam at hard X-ray free electron laser," Opt. Express 21, 15382-15388 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-13-15382


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