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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 14 — Jul. 15, 2013
  • pp: 16964–16974

Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors

V.V. Medvedev, A.J.R. van den Boogaard, R. van der Meer, A.E. Yakshin, E. Louis, V.M. Krivtsun, and F. Bijkerk  »View Author Affiliations

Optics Express, Vol. 21, Issue 14, pp. 16964-16974 (2013)

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We report on the development of a hybrid mirror realized by integrating an EUV-reflecting multilayer coating with a lamellar grating substrate. This hybrid mirror acts as an efficient Bragg reflector for extreme ultraviolet (EUV) radiation at a given wavelength while simultaneously providing spectral-selective suppression of the specular reflectance for unwanted longer-wavelength radiation due to the grating phase-shift resonance. The test structures, designed to suppress infrared (IR) radiation, were fabricated by masked deposition of a Si grating substrate followed by coating of the grating with a Mo/Si multilayer. To give the proof of principle, we developed such a hybrid mirror for the specific case of reflecting 13.5 nm radiation while suppressing 10 μm light, resulting in 61% reflectance at the wavelength of 13.5 nm together with the 70 × suppression rate of the specular reflection at the wavelength of 10 μm, but the considered filtering principle can be used for a variety of applications that are based on utilization of broadband radiation sources.

© 2013 OSA

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.5080) Diffraction and gratings : Phase shift
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(310.4165) Thin films : Multilayer design
(130.7408) Integrated optics : Wavelength filtering devices

ToC Category:
Thin Films

Original Manuscript: May 24, 2013
Revised Manuscript: July 1, 2013
Manuscript Accepted: July 1, 2013
Published: July 9, 2013

V.V. Medvedev, A.J.R. van den Boogaard, R. van der Meer, A.E. Yakshin, E. Louis, V.M. Krivtsun, and F. Bijkerk, "Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors," Opt. Express 21, 16964-16974 (2013)

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  1. J.-M. André, R. Benbalagh, R. Barchewitz, M.-F. Ravet, A. Raynal, F. Delmotte, F. Bridou, G. Julie, A. Bosseboeuf, R. Laval, G. Soullié, C. Rémond, and M. Fialin, “Soft x-ray multilayer monochromator with improved resolution and low specular background,” XRay Spectrom.30, 212–215 (2001). [CrossRef]
  2. R. Benbalagh, J.-M. Andre, R. Barchewitz, P. Jonnard, G. Julie, L. Mollard, G. Rolland, C. Remond, P. Troussel, R. Marmoret, and E. O. Filatova, “Lamellar multilayer amplitude grating as soft-X-ray Bragg monochromator,” Nucl. Instrum. Methods Phys. Res. A541(3), 590–597 (2005). [CrossRef]
  3. I. V. Kozhevnikov, R. van der Meer, H. M. J. Bastiaens, K. J. Boller, and F. Bijkerk, “High-resolution, high-reflectivity operation of lamellar multilayer amplitude gratings: identification of the single-order regime,” Opt. Express18(15), 16234–16242 (2010). [CrossRef] [PubMed]
  4. D. L. Voronov, M. Ahn, E. H. Anderson, R. Cambie, C.-H. Chang, E. M. Gullikson, R. K. Heilmann, F. Salmassi, M. L. Schattenburg, T. Warwick, V. V. Yashchuk, L. Zipp, and H. A. Padmore, “High-efficiency 5000 lines/mm multilayer-coated blazed grating for extreme ultraviolet wavelengths,” Opt. Lett.35(15), 2615–2617 (2010). [CrossRef] [PubMed]
  5. D. L. Voronov, E. H. Anderson, R. Cambie, S. Cabrini, S. D. Dhuey, L. I. Goray, E. M. Gullikson, F. Salmassi, T. Warwick, V. V. Yashchuk, and H. A. Padmore, “A 10,000 groove/mm multilayer coated grating for EUV spectroscopy,” Opt. Express19(7), 6320–6325 (2011). [CrossRef] [PubMed]
  6. A. J. R. van den Boogaard, E. Louis, F. A. van Goor, and F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE7271, 72713B, 72713B-6 (2009). [CrossRef]
  7. A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012). [CrossRef] [PubMed]
  8. J. Benschop, V. Banine, S. Lok, and E. Loopstra, “Extreme ultraviolet lithography: status and prospects,” J. Vac. Sci. Technol. B26(6), 2204–2207 (2008). [CrossRef]
  9. I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, and G. O. Vaschenko, “Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro/Nanolith. MEMS MOEMS11(2), 021110 (2012). [CrossRef]
  10. J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, and H. Mizoguchi, “Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021111 (2012). [CrossRef]
  11. J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332, 83220F, 83220F-13 (2012). [CrossRef]
  12. V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys.44(25), 253001 (2011). [CrossRef]
  13. C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, and G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro/Nanolith. MEMS MOEMS11(2), 021116 (2012). [CrossRef]
  14. V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, and E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett.33(6), 508–511 (2007). [CrossRef]
  15. N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012). [CrossRef]
  16. W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, and V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE7271, 72712Y, 72712Y-9 (2009). [CrossRef]
  17. W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, and V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett.34(23), 3680–3682 (2009). [CrossRef] [PubMed]
  18. M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. A. van der Westen, F. Bijkerk, and V. Banine, “Spectral-purity-enhancing layer for multilayer mirrors,” Opt. Lett.33(6), 560–562 (2008). [CrossRef] [PubMed]
  19. V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared suppression by hybrid EUV multilayer - IR etalon structures,” Opt. Lett.36(17), 3344–3346 (2011). [CrossRef] [PubMed]
  20. V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, and F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett.37(7), 1169–1171 (2012). [CrossRef] [PubMed]
  21. E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci.86(11-12), 255–294 (2011). [CrossRef]
  22. L. D. Landau and E. M. Lifshitz, The classical theory of fields (Butterworth-Heinemann, 1994).
  23. A. Barbara, P. Quémerais, E. Bustarret, T. López-Rios, and T. Fournier, “Electromagnetic resonances of sub-wavelength rectangular metallic gratings,” Eur. Phys. J. D23, 143–154 (2003). [CrossRef]
  24. M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of metallic surface-relief gratings,” J. Opt. Soc. Am. A3(11), 1780–1787 (1986). [CrossRef]
  25. K. N. Koshelev, V. V. Ivanov, V. G. Novikov, V. Medvedev, A. S. Grushin, and V. M. Krivtsun, “RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation,” J. Micro/Nanolith. MEMS MOEMS11(2), 021112 (2012). [CrossRef]
  26. N. R. Böwering, A. I. Ershov, W. F. Marx, O. V. Khodykin, B. A. M. Hansson, E. L. Vargas, J. A. Chavez, I. V. Fomenkov, D. W. Myers, and D. C. Brandt, “EUV source collector,” Proc. SPIE6151, 61513R (2006).
  27. A. R. Giehl, M. Kessler, A. Grosse, N. Herhammer, and H. Fouckhardt, “Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies,” J. Micromech. Microeng.13(2), 238–245 (2003). [CrossRef]
  28. A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Müllender, and F. Bijkerk, “Surface morphology of Kr+-polished amorphous Si layers,” J. Vac. Sci. Technol. A28(4), 552 (2010). [CrossRef]
  29. A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, and F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B29(5), 051803 (2011). [CrossRef]
  30. D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, and H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys.111(9), 093521 (2012). [CrossRef]

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