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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 16 — Aug. 12, 2013
  • pp: 19135–19141

Simultaneous compensation for aberration and axial elongation in three-dimensional laser nanofabrication by a high numerical-aperture objective

Benjamin. P. Cumming, Sukanta Debbarma, Barry Luther-Davis, and Min Gu  »View Author Affiliations

Optics Express, Vol. 21, Issue 16, pp. 19135-19141 (2013)

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One of the challenges in laser direct writing with a high numerical-aperture objective is the severe axial focal elongation and the pronounced effect of the refractive-index mismatch aberration. We present the simultaneous compensation for the refractive-index mismatch aberration and the focal elongation in three-dimensional laser nanofabrication by a high numerical-aperture objective. By the use of circularly polarized beam illumination and a spatial light modulator, a complex and dynamic slit pupil aperture can be produced to engineer the focal spot. Such a beam shaping method can result in circularly symmetric fabrication along the lateral directions as well as the dynamic compensation for the refractive-index mismatch aberration even when the laser beam is focused into the material of a refractive index up to 2.35.

© 2013 OSA

OCIS Codes
(220.1000) Optical design and fabrication : Aberration compensation
(220.4241) Optical design and fabrication : Nanostructure fabrication
(220.1080) Optical design and fabrication : Active or adaptive optics

ToC Category:
Laser Microfabrication

Original Manuscript: May 10, 2013
Revised Manuscript: July 20, 2013
Manuscript Accepted: July 22, 2013
Published: August 5, 2013

Benjamin. P. Cumming, Sukanta Debbarma, Barry Luther-Davis, and Min Gu, "Simultaneous compensation for aberration and axial elongation in three-dimensional laser nanofabrication by a high numerical-aperture objective," Opt. Express 21, 19135-19141 (2013)

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