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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 16 — Aug. 12, 2013
  • pp: 19163–19172

Design of non-polarizing cut-off filters based on dielectric-metal-dielectric stacks

Qing-Yuan Cai, Hai-Han Luo, Yu-Xiang Zheng, and Ding-Quan Liu  »View Author Affiliations

Optics Express, Vol. 21, Issue 16, pp. 19163-19172 (2013)

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Cut-off filters are usually operating at oblique incidence and exhibit polarization dependence properties. We propose a simple approach to design cut-off filters with low linear polarization sensitivity (LPS) based on dielectric-metal-dielectric (DMD) stacks. The designing method is derived from the theory of optical film characteristic matrix. The admittance loci of the film are adjusted to achieve similar spectral properties of s- and p-polarized light at oblique incidence. Different film structures are designed non-polarizing at different angles of incidence with the method. The results show that the designing method is efficient for designing non-polarizing cut-off filters, which are widely used in non-polarizing optical system.

© 2013 OSA

OCIS Codes
(260.5430) Physical optics : Polarization
(310.6860) Thin films : Thin films, optical properties
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: June 10, 2013
Revised Manuscript: July 26, 2013
Manuscript Accepted: July 31, 2013
Published: August 5, 2013

Qing-Yuan Cai, Hai-Han Luo, Yu-Xiang Zheng, and Ding-Quan Liu, "Design of non-polarizing cut-off filters based on dielectric-metal-dielectric stacks," Opt. Express 21, 19163-19172 (2013)

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