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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 2 — Jan. 28, 2013
  • pp: 1857–1864

Vertical-cavity and randomly scattered lasing from different thicknesses of epitaxial ZnO films grown on Y2O3-buffered Si (111)

C. C. Kuo, W.-R. Liu, B. H. Lin, W. F. Hsieh, C.-H. Hsu, W. C. Lee, M. Hong, and J. Kwo  »View Author Affiliations


Optics Express, Vol. 21, Issue 2, pp. 1857-1864 (2013)
http://dx.doi.org/10.1364/OE.21.001857


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Abstract

Two different types of lasing modes, vertical Fabry-Perot cavity and random lasing, were observed in ZnO epi-films of different thicknesses grown on Si (111) substrates. Under optical excitation at room temperature by a frequency tripled Nd:YVO4 laser with wavelength of 355 nm, the lasing thresholds are low due to high crystalline quality of the ZnO epitaxial films, which act as microresonators. For the thick ZnO layer (1,200 nm), its lasing action is originated from the random scattering due to the high density of crack networks developed in the thick ZnO film. However, the low crack density of the thin film (555 nm) fails to provide feedback loops essential for random scattering. Nevertheless, even the lower threshold lasing is achieved by the Fabry-Perot cavity formed by two interfaces of the thin ZnO film. The associated lasing modes of the thin ZnO film can be characterized as the transverse Gaussian modes attributed to the smooth curved surfaces.

© 2013 OSA

OCIS Codes
(140.3610) Lasers and laser optics : Lasers, ultraviolet
(140.5960) Lasers and laser optics : Semiconductor lasers
(160.4760) Materials : Optical properties
(160.4236) Materials : Nanomaterials

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: August 31, 2012
Revised Manuscript: October 12, 2012
Manuscript Accepted: December 19, 2012
Published: January 17, 2013

Citation
C. C. Kuo, W.-R. Liu, B. H. Lin, W. F. Hsieh, C.-H. Hsu, W. C. Lee, M. Hong, and J. Kwo, "Vertical-cavity and randomly scattered lasing from different thicknesses of epitaxial ZnO films grown on Y2O3-buffered Si (111)," Opt. Express 21, 1857-1864 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-2-1857


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