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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 2 — Jan. 28, 2013
  • pp: 2012–2017

Third-harmonic UV generation in silicon nitride nanostructures

Tingyin Ning, Outi Hyvärinen, Henna Pietarinen, Tommi Kaplas, Martti Kauranen, and Göery Genty  »View Author Affiliations

Optics Express, Vol. 21, Issue 2, pp. 2012-2017 (2013)

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We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ(3) (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10−20 m2/V2, which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.

© 2013 OSA

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(190.2620) Nonlinear optics : Harmonic generation and mixing
(050.5745) Diffraction and gratings : Resonance domain
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Nonlinear Optics

Original Manuscript: November 29, 2012
Revised Manuscript: January 9, 2013
Manuscript Accepted: January 10, 2013
Published: January 17, 2013

Tingyin Ning, Outi Hyvärinen, Henna Pietarinen, Tommi Kaplas, Martti Kauranen, and Göery Genty, "Third-harmonic UV generation in silicon nitride nanostructures," Opt. Express 21, 2012-2017 (2013)

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