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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 22 — Nov. 4, 2013
  • pp: 26123–26135

Comparative analysis of oxidation methods of reaction-sintered silicon carbide for optimization of oxidation-assisted polishing

Xinmin Shen, Yifan Dai, Hui Deng, Chaoliang Guan, and Kazuya Yamamura  »View Author Affiliations


Optics Express, Vol. 21, Issue 22, pp. 26123-26135 (2013)
http://dx.doi.org/10.1364/OE.21.026123


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Abstract

Combination of the oxidation of reaction-sintered silicon carbide (RS-SiC) and the polishing of the oxide is an effective way of machining RS-SiC. In this study, anodic oxidation, thermal oxidation, and plasma oxidation were respectively conducted to obtain oxides on RS-SiC surfaces. By performing scanning electron microscopy/energy dispersive X-ray spectroscopy (SEM-EDX) analysis and scanning white light interferometry (SWLI) measurement, the oxidation behavior of these oxidation methods was compared. Through ceria slurry polishing, the polishing properties of the oxides were evaluated. Analysis of the oxygen element on polished surfaces by SEM-EDX was conducted to evaluate the remaining oxide. By analyzing the three oxidation methods with corresponding polishing process on the basis of schematic diagrams, suitable application conditions for these methods were clarified. Anodic oxidation with simultaneous polishing is suitable for the rapid figuring of RS-SiC with a high material removal rate; polishing of a thermally oxidized surface is suitable for machining RS-SiC mirrors with complex shapes; combination of plasma oxidation and polishing is suitable for the fine finishing of RS-SiC with excellent surface roughness. These oxidation methods are expected to improve the machining of RS-SiC substrates and promote the application of RS-SiC products in the fields of optics, molds, and ceramics.

© 2013 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(220.5450) Optical design and fabrication : Polishing
(240.5770) Optics at surfaces : Roughness
(310.3840) Thin films : Materials and process characterization
(350.3850) Other areas of optics : Materials processing

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: August 5, 2013
Revised Manuscript: October 15, 2013
Manuscript Accepted: October 19, 2013
Published: October 24, 2013

Citation
Xinmin Shen, Yifan Dai, Hui Deng, Chaoliang Guan, and Kazuya Yamamura, "Comparative analysis of oxidation methods of reaction-sintered silicon carbide for optimization of oxidation-assisted polishing," Opt. Express 21, 26123-26135 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-22-26123


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References

  1. S. Suyama, T. Kameda, and Y. Itoh, “Development of high-strength reaction-sintered silicon carbide,” Diamond Related Materials12(3–7), 1201–1204 (2003). [CrossRef]
  2. S. W. Pang, T. Tamamura, M. Nakao, A. Ozawa, and H. Masuda, “Direct nano-printing on Al substrate using a SiC mold,” J. Vac. Sci. Technol. B16(3), 1145–1149 (1998). [CrossRef]
  3. A. Sayano, C. Sutoh, S. Suyama, Y. Itoh, and S. Nakagawa, “Development of a reaction-sintered silicon carbide matrix composite,” J. Nucl. Mater.271–272, 467–471 (1999). [CrossRef]
  4. D. A. Ersoy, M. J. McNallan, and Y. Gogotsi, “Carbon coatings produced by high temperature chlorination of silicon carbide ceramics,” Mater. Res. Innovations5(2), 55–62 (2001). [CrossRef]
  5. X. M. Shen, Y. F. Dai, H. Deng, C. L. Guan, and K. Yamamura, “Ultrasmooth reaction-sintered silicon carbide surface resulting from combination of thermal oxidation and ceria slurry polishing,” Opt. Express21(12), 14780–14788 (2013). [CrossRef] [PubMed]
  6. S. P. Lee, Y. S. Shin, D. S. Bae, B. H. Min, J. S. Park, and A. Kohyama, “Fabrication of liquid phase sintered SiC materials and their characterization,” Fusion Eng. Des.81(8–14), 963–967 (2006). [CrossRef]
  7. S. Suyama, Y. Itoh, K. Tsuno, and K. Ohno, “Φ650 mm optical space mirror substrate of high-strength reaction-sintered silicon carbide,” Proc. SPIE5868, 58680E, 58680E-10 (2005). [CrossRef]
  8. H. Y. Tam, H. B. Cheng, and Y. W. Wang, “Removal rate and surface roughness in the lapping and polishing of RB-SiC optical components,” J. Mater. Process. Technol.192–193, 276–280 (2007). [CrossRef]
  9. H. Kitahara, Y. Noda, F. Yoshida, H. Nakashima, N. Shinohara, and H. Abe, “Mechanical behavior of single-crystalline and polycrystalline silicon carbides evaluated by Vickers indentation,” J. Ceram. Soc. Jpn.109(1271), 602–606 (2001). [CrossRef]
  10. Z. Y. Zhang, J. W. Yan, and T. Kuriyagawa, “Study on tool wear characteristics in diamond turning of reaction-bonded silicon carbide,” Int. J. Adv. Manuf. Technol.57(1–4), 117–125 (2011). [CrossRef]
  11. Y. W. Kim, M. Mitomo, H. Emoto, and J. G. Lee, “Effect of Initial α‐Phase Content on Microstructure and Mechanical Properties of Sintered Silicon Carbide,” J. Am. Ceram. Soc.81(12), 3136–3140 (1998). [CrossRef]
  12. O. P. Chakrabarti, P. K. Das, and J. Mukerji, “Growth of SiC particles in reaction sintered SiC,” Mater. Chem. Phys.67(1–3), 199–202 (2001). [CrossRef]
  13. T. Grande, H. Sommerset, E. Hagen, K. Wiik, and M. A. Einarsrud, “Effect of Weight Loss on Liquid-Phase-Sintered Silicon Carbide,” J. Am. Ceram. Soc.80(4), 1047–1052 (1997). [CrossRef]
  14. S. S. Shinozaki, J. E. Noakes, and H. Sato, “Recrystallization and Phase Transformation in Reaction-Sintered SiC,” J. Am. Ceram. Soc.61(5–6), 237–242 (1978). [CrossRef]
  15. J. Yan, Z. Zhang, and T. Kuriyagawa, “Mechanism for material removal in diamond turning of reaction-bonded silicon carbide,” Int. J. Mach. Tools Manuf.49(5), 366–374 (2009). [CrossRef]
  16. H. Cheng, Z. Feng, Y. Wang, and S. Lei, “Magnetorheological finishing of SiC aspheric mirrors,” Mater. Manuf. Process.20(6), 917–931 (2005). [CrossRef]
  17. H. Deng and K. Yamamura, “Smoothing of reaction sintered silicon carbide using plasma assisted polishing,” Curr. Appl. Phys.12(3), S24–S28 (2012). [CrossRef]
  18. K. Yamamura, Y. Yamamoto, and H. Deng, “Preliminary Study on Chemical Figuring and Finishing of Sintered SiC Substrate Using Atmospheric Pressure Plasma,” in 45th CIRP Conference on Manufacturing Systems 2012 3, 335–339 (2012).
  19. Y. Song, S. Dhar, L. C. Feldman, G. Chung, and J. R. Williams, “Modified Deal Grove model for the thermal oxidation of silicon carbide,” J. Appl. Phys.95(9), 4953–4957 (2004). [CrossRef]
  20. B. E. Deal and A. S. Grove, “General Relationship for the Thermal Oxidation of Silicon,” J. Appl. Phys.36(12), 3770–3778 (1965). [CrossRef]
  21. K. Yamauchi, H. Mimura, K. Inagaki, and Y. Mori, “Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining,” Rev. Sci. Instrum.73(11), 4028–4033 (2002). [CrossRef]
  22. F. H. Zhang, X. Z. Song, Y. Zhang, and D. R. Luan, “Figuring of an ultra-smooth surface in nanoparticle colloid jet machining,” J. Micromech. Microeng.19(5), 054009 (2009). [CrossRef]
  23. J. Qian, G. Voronin, T. W. Zerda, D. He, and Y. Zhao, “High pressure, high temperature sintering of diamond-SiC composites by ball milled diamond-Si mixtures,” J. Mater. Res.17(08), 2153–2160 (2002). [CrossRef]
  24. A. B. Shorey, K. M. Kwong, K. M. Johnson, and S. D. Jacobs, “Nanoindentation hardness of particles used in magnetorheological finishing (MRF),” Appl. Opt.39(28), 5194–5204 (2000). [CrossRef] [PubMed]
  25. E. Pippel, J. Woltersdorf, H. Ö. Ólafsson, and E. Ö. Sveinbjörnsson, “Interfaces between 4H-SiC and SiO2: microstructure, nanochemistry and near-interface traps,” J. Appl. Phys.97(3), 034302 (2005). [CrossRef]
  26. J. S. Williams, B. Haberl, and J. E. Bradby, “Nanoindentation of ion implanted and deposited amorphous silicon,” MRS Online Proceedings Library 843, T6.3.1/R10.3.1- T6.3.5/R10.3.5 (2005),DOI: http://dx.doi.org/10.1557/PROC-843-T6.3/R10.3 .

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