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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 26 — Dec. 30, 2013
  • pp: 32013–32018

High-brightness X-ray free-electron laser with an optical undulator by pulse shaping

Chao Chang, Jinyang Liang, Dongwei Hei, Michael F. Becker, Kelei Tang, Yiping Feng, Vitaly Yakimenko, Claudio Pellegrini, and Juhao Wu  »View Author Affiliations


Optics Express, Vol. 21, Issue 26, pp. 32013-32018 (2013)
http://dx.doi.org/10.1364/OE.21.032013


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Abstract

A normal-incident flattop laser with a tapered end is proposed as an optical undulator to achieve a high-gain and high-brightness X-ray free electron laser (FEL). The synchronic interaction of an electron bunch with the normal incident laser is realized by tilting the laser pulse front. The intensity of the flattop laser is kept constant during the interaction time of the electron bunch and the laser along the focal plane of a cylindrical lens. Optical shaping to generate the desired flattop pulse with a tapered end from an original Gaussian pulse distribution is designed and simulated. The flattop laser with a tapered end can enhance the X-ray FEL beyond the exponential growth saturation power by one order to reach 1 Gigawatt as compared to that without a tapered end. The peak brightness can reach 1030 photons/mm2/mrad2/s/0.1% bandwidth, more than 10 orders brighter than the conventional incoherent Thompson Scattering X-ray source.

© 2013 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(140.2600) Lasers and laser optics : Free-electron lasers (FELs)
(140.3300) Lasers and laser optics : Laser beam shaping
(290.0290) Scattering : Scattering

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: October 8, 2013
Revised Manuscript: November 22, 2013
Manuscript Accepted: November 23, 2013
Published: December 17, 2013

Citation
Chao Chang, Jinyang Liang, Dongwei Hei, Michael F. Becker, Kelei Tang, Yiping Feng, Vitaly Yakimenko, Claudio Pellegrini, and Juhao Wu, "High-brightness X-ray free-electron laser with an optical undulator by pulse shaping," Opt. Express 21, 32013-32018 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-26-32013


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