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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 5 — Mar. 11, 2013
  • pp: 5391–5400

Method for characterization of Si waveguide propagation loss

Michele Moresco, Marco Romagnoli, Stefano Boscolo, Michele Midrio, Matteo Cherchi, Ehsan Shah Hosseini, Douglas Coolbaugh, Michael R. Watts, and Birendra Dutt  »View Author Affiliations

Optics Express, Vol. 21, Issue 5, pp. 5391-5400 (2013)

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A new method for measuring waveguide propagation loss in silicon nanowires is presented. This method, based on the interplay between traveling ring modes and standing wave modes due to back-scattering from edge roughess, is accurate and can be used for on wafer measurement of test structures. Examples of loss measurements and fitting are reported.

© 2013 OSA

OCIS Codes
(130.0130) Integrated optics : Integrated optics
(230.3120) Optical devices : Integrated optics devices
(230.5750) Optical devices : Resonators
(230.7370) Optical devices : Waveguides

ToC Category:
Integrated Optics

Original Manuscript: December 19, 2012
Revised Manuscript: February 4, 2013
Manuscript Accepted: February 5, 2013
Published: February 26, 2013

Michele Moresco, Marco Romagnoli, Stefano Boscolo, Michele Midrio, Matteo Cherchi, Ehsan Shah Hosseini, Douglas Coolbaugh, Michael R. Watts, and Birendra Dutt, "Method for characterization of Si waveguide propagation loss," Opt. Express 21, 5391-5400 (2013)

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