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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 7 — Apr. 8, 2013
  • pp: 8450–8459

A nanoscale conical polymethyl methacrylate (PMMA) sub-wavelength structure with a high aspect ratio realized by a stamping method

Dae-Seon Kim, Dong-Hyun Kim, and Jae-Hyung Jang  »View Author Affiliations


Optics Express, Vol. 21, Issue 7, pp. 8450-8459 (2013)
http://dx.doi.org/10.1364/OE.21.008450


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Abstract

A high aspect ratio conical sub-wavelength structure (SWS) was designed by using rigorous coupled-wave analysis (RCWA) method and was realized on polymethyl methacrylate (PMMA) film using a stamping technique. The silicon template containing a hexagonal array of conical holes with a period of 350 nm and an aspect ratio of 2.8 was fabricated by electron-beam (e-beam) lithography followed by a two-step etching process. The SWS with a high aspect ratio was easily transferred from the fabricated silicon template to PMMA film using the stamping method. The replicated PMMA SWS has an array of cones with nanoscale tips and an aspect ratio higher than 2.8. The average reflectance and transmittance of the PMMA film with the conical SWS in the wavelength ranging from 500 and 1500 nm was improved from 7.1 and 91.1% to 4.3 and 94.2%, respectively, as compared to flat PMMA film.

© 2013 OSA

OCIS Codes
(220.4241) Optical design and fabrication : Nanostructure fabrication
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: February 7, 2013
Revised Manuscript: March 10, 2013
Manuscript Accepted: March 15, 2013
Published: March 29, 2013

Citation
Dae-Seon Kim, Dong-Hyun Kim, and Jae-Hyung Jang, "A nanoscale conical polymethyl methacrylate (PMMA) sub-wavelength structure with a high aspect ratio realized by a stamping method," Opt. Express 21, 8450-8459 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-7-8450


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