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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 21, Iss. 7 — Apr. 8, 2013
  • pp: 9017–9023

Sub-100nm pattern generation by laser direct writing using a confinement layer

Jan-Hendrik Klein-Wiele and Peter Simon  »View Author Affiliations


Optics Express, Vol. 21, Issue 7, pp. 9017-9023 (2013)
http://dx.doi.org/10.1364/OE.21.009017


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Abstract

A novel technique is introduced that dramatically increases the quality and spatial resolution of directly ablated periodic nanostructures on materials. The presented method utilizes a PMMA confinement layer spin coated on the surface of the ablated material reducing the violence and speed of expansion of the molten material. As a result, droplet formation deteriorating the achievable resolution can be completely avoided. Moreover, motion control of the molten material leads to structural details with dimensions well below the irradiation wavelength.

© 2013 OSA

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: February 27, 2013
Revised Manuscript: March 22, 2013
Manuscript Accepted: March 22, 2013
Published: April 4, 2013

Citation
Jan-Hendrik Klein-Wiele and Peter Simon, "Sub-100nm pattern generation by laser direct writing using a confinement layer," Opt. Express 21, 9017-9023 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-7-9017


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