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Energy Express

Energy Express

  • Editor: Christian Seassal
  • Vol. 21, Iss. S1 — Jan. 14, 2013
  • pp: A42–A52

Nanophotonic light trapping in 3-dimensional thin-film silicon architectures

Daniel Lockau, Tobias Sontheimer, Christiane Becker, Eveline Rudigier-Voigt, Frank Schmidt, and Bernd Rech  »View Author Affiliations


Optics Express, Vol. 21, Issue S1, pp. A42-A52 (2013)
http://dx.doi.org/10.1364/OE.21.000A42


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Abstract

Emerging low cost and large area periodic texturing methods promote the fabrication of complex absorber structures for thin film silicon solar cells. We present a comprehensive numerical analysis of a 2μm square periodic polycrystalline silicon absorber architecture designed in our laboratories. Simulations are performed on the basis of a precise finite element reconstruction of the experimentally realized silicon structure. In contrast to many other publications, superstrate light trapping effects are included in our model. Excellent agreement to measured absorptance spectra is obtained. For the inclusion of the absorber into a standard single junction cell layout, we show that light trapping close to the Yablonovitch limit can be realized, but is usually strongly damped by parasitic absorption.

© 2012 OSA

OCIS Codes
(350.6050) Other areas of optics : Solar energy
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(310.6845) Thin films : Thin film devices and applications

ToC Category:
Photovoltaics

History
Original Manuscript: August 31, 2012
Manuscript Accepted: October 9, 2012
Published: November 26, 2012

Citation
Daniel Lockau, Tobias Sontheimer, Christiane Becker, Eveline Rudigier-Voigt, Frank Schmidt, and Bernd Rech, "Nanophotonic light trapping in 3-dimensional thin-film silicon architectures," Opt. Express 21, A42-A52 (2013)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-21-S1-A42


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