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Polarization insensitive infrared absorbing behaviour of one-dimensional multilayer stack: a fractal approach

M. C. Larciprete, M. Centini, R. Li Voti, M. Bertolotti, and C. Sibilia

Open Access Open Access

Abstract

The control and tailoring of infrared absorbance/emittance is a crucial task for all those applications involving thermal radiation management and detection. We theoretically investigated the peculiar absorbing/emitting behaviour of pre-fractal Cantor multilayers, in order to design a polarization-insensitive multilayer stack absorbing over a wide angular lobe in the mid wavelength infrared range (8-10 μm). Using transfer matrix method, we explored the spectral properties arising from both the material and the geometrical dispersion. We considered several combinations of the constituent materials: SiO2 was combined with TiO2 and Si, respectively.

© 2014 Optical Society of America

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Figures (4)
Fig. 1
Fig. 1 (a) Schematic of proposed fractal layered structure, arranged as third generation of a triadic Cantor set for thermal emission control. The substrate is silicon. (b) Calculated absorbance as a function of wavelength and incidence angle, for single thick SiO2 layer, 27 QW thick, for average polarized light.

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Fig. 2
Fig. 2 Calculated absorbance as a function of wavelength and incidence angle, for a Cantor multilayer structure composed by TiO2 (initiator) and SiO2 layers, for TE (a) and TM (b) polarized light. The substrate is silicon. The inset display the dispersion law of (a, inset) refractive index and (b, inset) extinction coefficient for TiO2 (blue curves) and SiO2 (red curves) [13].

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Fig. 3
Fig. 3 Calculated FOM as a function of the reference wavelength, λ0, for: (a) the Cantor stack and the periodic stack (composed by TiO2 and SiO2 layers) and the single SiO2 layer (27 QW thick). (b) the Cantor stack and the periodic stack (composed by Si and SiO2 layers). The angular range is set to θΜΙΝ = 0° and θMAX = 70° and wavelength range is set to λΜΙΝ = 8 μm and λMAX = 10 μm.

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Fig. 4
Fig. 4 (a) Calculated absorbance vs wavelength and incidence angle, for the optimized Cantor multilayer structure (λ0 = 1.75 μm) composed by Si and SiO2 layers, for average polarization of light. Substrate is silicon. The inset display the dispersion law of refractive index (blue curve) and extinction coefficient (red curve) of Si. (b) Polar plot of absorbance curve calculated at λ = 9.05 μm, for the Cantor stack (red curves) and the periodic stack (black curves) composed by Si and SiO2 layers; and for the single SiO2 layer, 27 QW thick (blue curves).

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Equations (3)

Equations on this page are rendered with MathJax. Learn more.

A( 1QW )/B( 1QW )/A( 1QW )/B( 3QW )/A( 1QW )/B( 1QW )/A( 1QW )
FOM= ( 〈 A TM 〉+〈 A TE 〉 ) 2 .
〈 A i ( Δθ,Δλ ) 〉= 1 Δθ⋅Δλ ∫ θ MIN θ MAX ( ∫ λ MIN λ MAX A i dλ ) dθ; i=TE,TM
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