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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 11 — Jun. 2, 2014
  • pp: 12935–12943

Impact of lithography on the fluorescence dynamics of self-assembled fluorophores

Islam Ashry, Ishac Kandas, Xiangyu Wei, Joseph A. Calderone, Baigang Zhang, Hans D. Robinson, James R. Heflin, Webster L. Santos, and Yong Xu  »View Author Affiliations

Optics Express, Vol. 22, Issue 11, pp. 12935-12943 (2014)

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Micro- and nano-patterned fluorescent materials are important for many photonic devices and applications. In this paper, we investigate the impact of three common lithographical techniques, deposition and removal of sacrificial masks, ultraviolet ablation, and focused ion beam milling, on self-assembled fluorophores. We find that different patterning techniques can dramatically change the fluorescence lifetime of the fluorophores and that the degree of modification depends on the patterning techniques.

© 2014 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(260.2510) Physical optics : Fluorescence
(110.4235) Imaging systems : Nanolithography

ToC Category:
Optical Materials

Original Manuscript: February 21, 2014
Revised Manuscript: March 26, 2014
Manuscript Accepted: April 5, 2014
Published: May 21, 2014

Islam Ashry, Ishac Kandas, Xiangyu Wei, Joseph A. Calderone, Baigang Zhang, Hans D. Robinson, James R. Heflin, Webster L. Santos, and Yong Xu, "Impact of lithography on the fluorescence dynamics of self-assembled fluorophores," Opt. Express 22, 12935-12943 (2014)

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