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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 12 — Jun. 16, 2014
  • pp: 14958–14963

Motion-free all optical inspection system for nanoscale topology control

Maxim Ryabko, Sergey Koptyaev, Alexander Shcherbakov, Alexey Lantsov, and S. Y. Oh  »View Author Affiliations

Optics Express, Vol. 22, Issue 12, pp. 14958-14963 (2014)

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We present a novel all optical method for nanoscale pattern inspection. This method uses the chromatic aberration in an imaging optical system and a tunable light source. Such an approach allows stable and precise inspection of nanoscale objects based on an analysis of their defocused diffraction patterns without any external mechanical influence on the sample or optical system. We demonstrate the efficiency of a low cost light source tunable in the range of a light emitting diode bandwidth of ~30 nm (FWHM) for providing the required defocusing. The proposed method is tested using calibrated lines (height 50 nm, length 100 μm, critical dimension (СD) value range 40-150 nm with 10 nm steps) on a monocrystalline silicon substrate with demonstrated measurement accuracy better than 10 nm. A comparison of this all optical method with a mechanical scanning inspection system is discussed.

© 2014 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.5820) Instrumentation, measurement, and metrology : Scattering measurements
(180.0180) Microscopy : Microscopy
(260.0260) Physical optics : Physical optics
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: March 21, 2014
Revised Manuscript: May 16, 2014
Manuscript Accepted: May 19, 2014
Published: June 11, 2014

Virtual Issues
Vol. 9, Iss. 8 Virtual Journal for Biomedical Optics

Maxim Ryabko, Sergey Koptyaev, Alexander Shcherbakov, Alexey Lantsov, and S. Y. Oh, "Motion-free all optical inspection system for nanoscale topology control," Opt. Express 22, 14958-14963 (2014)

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  1. I. T. R. S. Roadmap, http://www.itrs.net/Links/2006Update/2006UpdateFinal.htm
  2. A. Vaid, L. Subramany, G. Iddawela, C. Ford, J. Allgair, G. Agrawal, J. Taylor, C. Hartig, B. C. Kang, C. Bozdog, M. Sendelbach, P. Isbester, and L. Issascharoff, “Implementation of hybrid metrology at HVM fab for 20 nm and beyond,” Proc. SPIE 8681, 868103 (2013). [CrossRef]
  3. D. Herisson, D. Neira, C. Fernand, P. Thony, D. Henry, S. Kremer, M. Polli, M. Guevremont, and A. Elazami, “Spectroscopic ellipsometry for lithography front-end level CD control: a complete analysis for production integration,” Proc. SPIE 5038, 264–273 (2003). [CrossRef]
  4. C. J. Raymond, M. Littau, R. Markle, and M. Purdy, “Scatterometry for shallow trench isolation (STI) process metrology,” Proc. SPIE 4344, 716–725 (2001). [CrossRef]
  5. R. M. Silver, R. Attota, M. Stocker, J. Jun, E. Marx, R. Larrabee, B. Russo, and M. Davidson, “Comparison of measured optical image profiles of silicon lines with two different theoretical models,” Proc. SPIE 4689, 409–429 (2002). [CrossRef]
  6. R. Attota, R. M. Silver, M. T. Stocker, E. Marx, J.-S. J. Jun, M. P. Davidson, and R. D. Larrabee, “A new method to enhance overlay tool performance,” Proc. SPIE 5038, 428–436 (2003). [CrossRef]
  7. R. Attota, R. M. Silver, M. R. Bishop, and R. G. Dixson, “Optical critical dimension measurement and illumination analysis using the through-focus focus metric,” Proc. SPIE 6152, 190–200 (2006).
  8. R. Attota, T. A. Germer, and R. M. Silver, “Through-focus scanning-optical-microscope imaging method for nanoscale dimensional analysis,” Opt. Lett. 33(17), 1990–1992 (2008). [CrossRef] [PubMed]
  9. M. V. Ryabko, S. N. Koptyaev, A. V. Shcherbakov, A. D. Lantsov, and S. Y. Oh, “Method for optical inspection of nanoscale objects based upon analysis of their defocused images and features of its practical implementation,” Opt. Express 21(21), 24483–24489 (2013). [CrossRef] [PubMed]
  10. J. Kim, D. Kang, and D. Gweon, “Spectrally encoded slit confocal microscopy,” Opt. Lett. 31(11), 1687–1689 (2006). [CrossRef] [PubMed]
  11. A. V. Arecchi, T. Messadi, and R. J. Koshel, Field Guide to Illumination (SPIE Press, 2007)

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