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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 14 — Jul. 14, 2014
  • pp: 16889–16896

Numerical analysis of the sub-wavelength fabrication of MTMO grayscale photomasks by direct laser writing

Feng Xia, Xinzheng Zhang, Meng Wang, Sanming Yi, Qian Liu, and Jingjun Xu  »View Author Affiliations


Optics Express, Vol. 22, Issue 14, pp. 16889-16896 (2014)
http://dx.doi.org/10.1364/OE.22.016889


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Abstract

Metal-transparent-metallic-oxide (MTMO) grayscale photomasks fabricated by direct laser writing have been proposed in recent years. The fabrication mechanism is attributed to light-induced melt-oxidization. The temporal-spatial distribution of temperature fields of indium film-glass samples under a laser pulse have been calculated by the Finite-Difference Time-Domain method. The laser action area of the indium film is studied based on the oxidation theories and the absorbed laser power density distribution in molten indium films. The calculated average sub-wavelength fabrication diameter of 302 nm is consistent with the experimental fabrication size under a laser power of 6.0 - 8.0 mW.

© 2014 Optical Society of America

OCIS Codes
(160.3900) Materials : Metals
(200.0200) Optics in computing : Optics in computing
(160.4236) Materials : Nanomaterials
(310.6845) Thin films : Thin film devices and applications

ToC Category:
Laser Microfabrication

History
Original Manuscript: April 3, 2014
Revised Manuscript: June 1, 2014
Manuscript Accepted: June 18, 2014
Published: July 2, 2014

Citation
Feng Xia, Xinzheng Zhang, Meng Wang, Sanming Yi, Qian Liu, and Jingjun Xu, "Numerical analysis of the sub-wavelength fabrication of MTMO grayscale photomasks by direct laser writing," Opt. Express 22, 16889-16896 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-14-16889


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