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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 14 — Jul. 14, 2014
  • pp: 17099–17106

Three-dimensional photonic crystals created by single-step multi-directional plasma etching

Katsuyoshi Suzuki, Keisuke Kitano, Kenji Ishizaki, and Susumu Noda  »View Author Affiliations

Optics Express, Vol. 22, Issue 14, pp. 17099-17106 (2014)

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We fabricate 3D photonic nanostructures by simultaneous multi-directional plasma etching. This simple and flexible method is enabled by controlling the ion-sheath in reactive-ion-etching equipment. We realize 3D photonic crystals on single-crystalline silicon wafers and show high reflectance (>95%) and low transmittance (<-15dB) at optical communication wavelengths, suggesting the formation of a complete photonic bandgap. Moreover, our method simply demonstrates Si-based 3D photonic crystals that show the photonic bandgap effect in a shorter wavelength range around 0.6 μm, where further fine structures are required.

© 2014 Optical Society of America

OCIS Codes
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(220.4241) Optical design and fabrication : Nanostructure fabrication
(160.5293) Materials : Photonic bandgap materials
(160.5298) Materials : Photonic crystals
(050.6875) Diffraction and gratings : Three-dimensional fabrication

ToC Category:
Photonic Crystals

Original Manuscript: May 15, 2014
Revised Manuscript: June 20, 2014
Manuscript Accepted: June 25, 2014
Published: July 3, 2014

Katsuyoshi Suzuki, Keisuke Kitano, Kenji Ishizaki, and Susumu Noda, "Three-dimensional photonic crystals created by single-step multi-directional plasma etching," Opt. Express 22, 17099-17106 (2014)

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