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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 15 — Jul. 28, 2014
  • pp: 17948–17958

Characterization of semiconductor materials using synchrotron radiation-based near-field infrared microscopy and nano-FTIR spectroscopy

Peter Hermann, Arne Hoehl, Georg Ulrich, Claudia Fleischmann, Antje Hermelink, Bernd Kästner, Piotr Patoka, Andrea Hornemann, Burkhard Beckhoff, Eckart Rühl, and Gerhard Ulm  »View Author Affiliations

Optics Express, Vol. 22, Issue 15, pp. 17948-17958 (2014)

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We describe the application of scattering-type near-field optical microscopy to characterize various semiconducting materials using the electron storage ring Metrology Light Source (MLS) as a broadband synchrotron radiation source. For verifying high-resolution imaging and nano-FTIR spectroscopy we performed scans across nanoscale Si-based surface structures. The obtained results demonstrate that a spatial resolution below 40 nm can be achieved, despite the use of a radiation source with an extremely broad emission spectrum. This approach allows not only for the collection of optical information but also enables the acquisition of near-field spectral data in the mid-infrared range. The high sensitivity for spectroscopic material discrimination using synchrotron radiation is presented by recording near-field spectra from thin films composed of different materials used in semiconductor technology, such as SiO2, SiC, SixNy, and TiO2.

© 2014 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(240.0240) Optics at surfaces : Optics at surfaces
(300.0300) Spectroscopy : Spectroscopy
(310.6860) Thin films : Thin films, optical properties
(180.4243) Microscopy : Near-field microscopy

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: May 5, 2014
Revised Manuscript: June 13, 2014
Manuscript Accepted: June 16, 2014
Published: July 17, 2014

Peter Hermann, Arne Hoehl, Georg Ulrich, Claudia Fleischmann, Antje Hermelink, Bernd Kästner, Piotr Patoka, Andrea Hornemann, Burkhard Beckhoff, Eckart Rühl, and Gerhard Ulm, "Characterization of semiconductor materials using synchrotron radiation-based near-field infrared microscopy and nano-FTIR spectroscopy," Opt. Express 22, 17948-17958 (2014)

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