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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 16 — Aug. 11, 2014
  • pp: 19365–19374

High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths

Qiushi Huang, Meint de Boer, Jonathan Barreaux, Robert van der Meer, Eric Louis, and Fred Bijkerk  »View Author Affiliations

Optics Express, Vol. 22, Issue 16, pp. 19365-19374 (2014)

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High spectral purity at longer wavelength side is demanded in many extreme ultraviolet (EUV) and soft X-ray (together also referred to as XUV) optical systems. It is usually obtained at the expense of a high loss of XUV efficiency. We proposed and developed a new method based on a periodic, tapered structure integrated with an EUV multilayer. The longer wavelength radiation is scattered/diffracted away by the tapered multilayer structure while the EUV light is reflected. The first proof-of-principle showed a broadband suppression from λ = 100-400 nm with an average factor of 14. Moreover, a high EUV reflectance of 64.7% was achieved, which corresponds to 94% of the efficiency of a regular EUV multilayer mirror.

© 2014 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(310.1620) Thin films : Interference coatings
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Thin Films

Original Manuscript: May 21, 2014
Revised Manuscript: July 13, 2014
Manuscript Accepted: July 13, 2014
Published: August 4, 2014

Qiushi Huang, Meint de Boer, Jonathan Barreaux, Robert van der Meer, Eric Louis, and Fred Bijkerk, "High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths," Opt. Express 22, 19365-19374 (2014)

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  1. I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. L. Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, and D. W. Myers, “Laser produced plasma EUV light source for EUVL patterning at 20nm node and beyond,” Proc. SPIE8679, 86792I (2013). [CrossRef]
  2. Y. Teramoto, G. Niimi, D. Yamatani, Y. Joshima, K. Bessho, T. Shirai, T. Takemura, T. Yokota, H. Yabuta, K. C. Paul, K. Kabuki, K. Miyauchi, M. Ikeuchi, K. Hotta, M. Yoshioka, and H. Sato, “Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM,” Proc. SPIE6151, 615147 (2006). [CrossRef]
  3. F. Brandi, D. Neshev, and W. Ubachs, “High-order harmonic generation yielding tunable extreme-ultraviolet radiation of high spectral purity,” Phys. Rev. Lett.91(16), 163901 (2003). [CrossRef] [PubMed]
  4. J. Lilensten, T. Dudok de Wit, M. Kretzschmar, P.-O. Amblard, S. Moussaoui, J. Aboudarham, and F. Auchère, “Review on the solar spectral variability in the EUV for space weather purposes,” Ann. Geophys.26(2), 269–279 (2008). [CrossRef]
  5. E. Louis, A. E. Yakshin, T. Tsarfati, and F. Bijkerk, “Nanometer interface and materials control for multilayer EUV-optical applications,” Prog. Surf. Sci.86(11-12), 255–294 (2011). [CrossRef]
  6. I. A. Artyukov, A. I. Fedorenko, V. V. Kondratenko, S. A. Yulin, and A. V. Vinogradov, “Soft X-ray submicron imaging experiments with nanosecond exposure,” Opt. Commun.102(5-6), 401–406 (1993). [CrossRef]
  7. J. Fujimoto, T. Hori, T. Yanagida, T. Ohta, Y. Kawasuji, Y. Shiraishi, T. Abe, T. Kodama, H. Nakarai, T. Yamazaki, and H. Mizoguchi, “Development of laser-produced plasma-based EUV light source technology for HVM EUV lithography,” Proc. SPIE8332(83220F), 83220F (2012). [CrossRef]
  8. V. Y. Banine, K. N. Koshelev, and G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys.44(25), 253001 (2011). [CrossRef]
  9. N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, and A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,” J. Micro/Nanolith. MEMS MOEMS11(2), 021115 (2012). [CrossRef]
  10. M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. A. van der Westen, F. Bijkerk, and V. Banine, “Spectral-purity-enhancing layer for multilayer mirrors,” Opt. Lett.33(6), 560–562 (2008). [CrossRef] [PubMed]
  11. S. P. Huber, R. W. E. van de Kruijs, A. E. Yakshin, E. Zoethout, K.-J. Boller, and F. Bijkerk, “Subwavelength single layer absorption resonance antireflection coatings,” Opt. Express22(1), 490–497 (2014). [CrossRef] [PubMed]
  12. A. J. R. van den Boogaard, F. A. van Goor, E. Louis, and F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett.37(2), 160–162 (2012). [CrossRef] [PubMed]
  13. H. Kierey, K. Heidemann, B. Kleemann, R. Winters, W. Egle, W. Singer, F. Melzer, R. Wevers, and M. Antoni, “EUV spectral purity filter: optical and mechanical design, gratings fabrication, and testing,” Proc. SPIE5193, 70–78 (2004). [CrossRef]
  14. D. L. Voronov, E. M. Gullikson, F. Salmassi, T. Warwick, and H. A. Padmore, “Enhancement of diffraction efficiency via higher-order operation of a multilayer blazed grating,” Opt. Lett.39(11), 3157–3160 (2014). [CrossRef] [PubMed]
  15. Q. Huang, D. M. Paardekooper, E. Zoethout, V. V. Medvedev, R. W. E. van de Kruijs, J. Bosgra, E. Louis, and F. Bijkerk, “UV spectral filtering by surface structured multilayer mirrors,” Opt. Lett.39(5), 1185–1188 (2014). [CrossRef] [PubMed]
  16. Website of the Rosft, http://optics.synopsys.com/rsoft/rsoft-passive-device-diffractMOD.html
  17. M. G. Moharam and T. K. Gaylord, “Rigorous coupled-wave analysis of grating diffraction - E-mode polarization and losses,” J. Opt. Soc. Am.73(4), 451 (1983). [CrossRef]
  18. D. Attwood, Soft X-rays and Extreme Ultraviolet Radiation, Principles and Applications (Cambridge University, 1999), pp 304–306.

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