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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 2 — Jan. 27, 2014
  • pp: 1760–1767

Demonstration of a large-scale optical exceptional point structure

Liang Feng, Xuefeng Zhu, Sui Yang, Hanyu Zhu, Peng Zhang, Xiaobo Yin, Yuan Wang, and Xiang Zhang  »View Author Affiliations


Optics Express, Vol. 22, Issue 2, pp. 1760-1767 (2014)
http://dx.doi.org/10.1364/OE.22.001760


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Abstract

We report a large-size (4-inch) optical exceptional point structure at visible frequencies by designing a multilayer structure of absorbing and non-absorbing dielectrics. The optical exceptional point was implemented as indicated by the realized unidirectional reflectionless light transport at a wafer scale. The associated abrupt phase transition is theoretically and experimentally confirmed when crossing over the exceptional point in wavelengths. The large scale demonstration of phase transition around exceptional points will open new possibilities in important applications in free space optical devices.

© 2013 Optical Society of America

OCIS Codes
(310.4165) Thin films : Multilayer design
(310.6845) Thin films : Thin film devices and applications

ToC Category:
Thin Films

History
Original Manuscript: November 4, 2013
Revised Manuscript: December 17, 2013
Manuscript Accepted: December 18, 2013
Published: January 17, 2013

Citation
Liang Feng, Xuefeng Zhu, Sui Yang, Hanyu Zhu, Peng Zhang, Xiaobo Yin, Yuan Wang, and Xiang Zhang, "Demonstration of a large-scale optical exceptional point structure," Opt. Express 22, 1760-1767 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-2-1760


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