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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 3 — Feb. 10, 2014
  • pp: 2489–2496

CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler

Hang Guan, Ari Novack, Matthew Streshinsky, Ruizhi Shi, Qing Fang, Andy Eu-Jin Lim, Guo-Qiang Lo, Tom Baehr-Jones, and Michael Hochberg  »View Author Affiliations


Optics Express, Vol. 22, Issue 3, pp. 2489-2496 (2014)
http://dx.doi.org/10.1364/OE.22.002489


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Abstract

We present a highly efficient polarization splitter and rotator (PSR), fabricated using 248 nm deep ultraviolet lithography on a silicon-on-insulator substrate. The PSR is based on a double-etched directional coupler with a length of 27 µm. The fabricated PSR yields a TM-to-TE conversion loss better than 0.5 dB and TE insertion loss better than 0.3 dB, with an ultra-low crosstalk (−20 dB) in the wavelength regime 1540-1570 nm.

© 2014 Optical Society of America

OCIS Codes
(130.0130) Integrated optics : Integrated optics
(130.3120) Integrated optics : Integrated optics devices
(130.5440) Integrated optics : Polarization-selective devices

ToC Category:
Integrated Optics

History
Original Manuscript: October 30, 2013
Revised Manuscript: January 12, 2014
Manuscript Accepted: January 19, 2014
Published: January 29, 2014

Citation
Hang Guan, Ari Novack, Matthew Streshinsky, Ruizhi Shi, Qing Fang, Andy Eu-Jin Lim, Guo-Qiang Lo, Tom Baehr-Jones, and Michael Hochberg, "CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler," Opt. Express 22, 2489-2496 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-3-2489


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References

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