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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 3 — Feb. 10, 2014
  • pp: 2770–2781

A 2 D high accuracy slope measuring system based on a Stitching Shack Hartmann Optical Head

Mourad Idir, Konstantine Kaznatcheev, Guillaume Dovillaire, Jerome Legrand, and Rakchanok Rungsawang  »View Author Affiliations


Optics Express, Vol. 22, Issue 3, pp. 2770-2781 (2014)
http://dx.doi.org/10.1364/OE.22.002770


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Abstract

We present a 2D Slope measuring System based on a Stitching Shack Hartmann Optical Head (SSH-OH) aiming to perform high accuracy optical metrology for X-ray mirrors. This system was developed to perform high-accuracy automated metrology for extremely high quality optical components needed for synchrotrons or Free Electrons Lasers (FEL), EUV lithography and x-ray astronomy with slope error accuracy better than 50 nrad rms.

© 2014 Optical Society of America

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(340.0340) X-ray optics : X-ray optics
(340.6720) X-ray optics : Synchrotron radiation
(340.7470) X-ray optics : X-ray mirrors

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: December 26, 2013
Revised Manuscript: January 16, 2014
Manuscript Accepted: January 17, 2014
Published: January 30, 2014

Citation
Mourad Idir, Konstantine Kaznatcheev, Guillaume Dovillaire, Jerome Legrand, and Rakchanok Rungsawang, "A 2 D high accuracy slope measuring system based on a Stitching Shack Hartmann Optical Head," Opt. Express 22, 2770-2781 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-3-2770


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References

  1. H. Yumoto, H. Mimura, T. Koyama, S. Matsuyama, K. Tono, T. Togashi, Y. Inubushi, T. Sato, K. Tanaka, T. Kimura, H. Yokoyama, J. Kim, Y. Sano, Y. Hachisu, M. Yabashi, H. Ohashi, H. Ohmori, T. Ishikawa, K. Yamauchi, “Focusing of x-ray free-electron laser pulses with reflective optics,” Nat. Photonics 7(1), 43–47 (2013). [CrossRef]
  2. F. Siewert, J. Buchheim, S. Boutet, G. J. Williams, P. A. Montanez, J. Krzywinski, R. Signorato, “Ultra-precise characterization of LCLS hard X-ray focusing mirrors by high resolution slope measuring deflectometry,” Opt. Express 20(4), 4525–4536 (2012). [CrossRef] [PubMed]
  3. S. Matsuyama, T. Wakioka, N. Kidani, T. Kimura, H. Mimura, Y. Sano, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, K. Yamauchi, “One-dimensional Wolter optics with a sub-50 nm spatial resolution,” Opt. Lett. 35(21), 3583–3585 (2010). [CrossRef] [PubMed]
  4. H. Mimura, H. Yumoto, S. Matsuyama, Y. Sano, K. Yamamura, Y. Mori, M. Yabashi, Y. Nishino, K. Tamasaku, T. Ishikawa, K. Yamauchi, “Efficient focusing of hard x rays to 25 nm by a total reflection mirror,” Appl. Phys. Lett. 90(5), 051903 (2007). [CrossRef]
  5. H. Mimura, S. Handa, T. Kimura, H. Yumoto, D. Yamakawa, H. Yokoyama, S. Matsuyama, K. Inagaki, K. Yamamura, Y. Sano, K. Tamasaku, Y. Nishino, M. Yabashi, T. Ishikawa, K. Yamauchi, “Breaking the 10 nm barrier in hard-X-ray focusing,” Nat. Phys. 6(2), 122–125 (2009). [CrossRef]
  6. J. Hartmann, “Objektivuntersuchungen,” Z. Instrumentenkunde 24, 1–21 (1904).
  7. R. V. Shack, “Production and use of a lenticular Hartmann screen,” J. Opt. Soc. Am. 61, 656–660 (1971).
  8. B. C. Platt, R. Shack, “History and principles of Shack-Hartmann wavefront sensing,” J. Refract. Surg. 17(5), S573–S577 (2001). [PubMed]
  9. D. Malacara-Doblado and I. Ghozeil, “Hartmann, Hartmann-Shack, and other screen tests,” in Optical Shop Testing, 3rd ed., D. Malacara, ed. (Wiley, 2007), pp. 361–397.
  10. S. N. Qian and P. Z. Takacs, “Nano-accuracy surface figure metrology of precision optics,” in Modern Metrology Concerns, L. Cocco, ed. (InTech, 2012), pp. 77–114.
  11. S. N. Qian, P. Z. Takacs, “Design of multiple-function long trace profiler,” Opt. Eng. 46(4), 043602 (2007).
  12. M. Thomasset, S. Brochet, F. Polack, “Latest metrology results with the SOLEIL synchrotron LTP,” Proc. SPIE 5921, 592102 (2005). [CrossRef]
  13. P. Z. Takacs, S. N. Qian, J. Colbert, “Design of a long trace surface profiler,” Proc. SPIE 749, 59–64 (1987). [CrossRef]
  14. S. N. Qian, W. Jark, P. Z. Takacs, “The penta-prism LTP: A long-trace-profiler with stationary optical head and moving penta prism,” Rev. Sci. Instrum. 66(3), 2562–2569 (1995). [CrossRef]
  15. P. Su, J. H. Burge, B. Cuerden, J. Sasian, H. M. Martin, “Scanning pentaprism measurements of off-axis aspherics,” Proc. SPIE 7018, 70183T (2008). [CrossRef]
  16. P. Su, J. H. Burge, B. Cuerden, R. Allen, H. M. Martin, “Scanning pentaprism measurements of off-axis aspherics II,” Proc. SPIE 7426, 74260Y (2009). [CrossRef]
  17. F. Siewert, J. Buchheim, T. Zeschke, “Characterization and calibration of 2nd generation slope measuring profiler,” Nucl. Instrum. Methods A 616(2–3), 119–127 (2010). [CrossRef]
  18. S. G. Alcock, K. J. S. Sawhney, S. Scott, U. Pedersen, R. Walton, F. Siewert, T. Zeschke, F. Senf, T. Noll, H. Lammert, “The Diamond-NOM: A non-contact profiler capable of characterizing optical figure error with sub-nanometre repeatability,” Nucl. Instrum. Methods A 616(2-3), 224–228 (2010). [CrossRef]
  19. L. Assoufid, N. Brown, D. Crews, J. Sullivan, M. Erdmann, J. Qian, P. Jemian, V. V. Yashchuk, P. Z. Takacs, N. A. Artemiev, D. J. Merthe, W. R. McKinney, F. Siewert, T. Zeschke, “Development of a high-performance gantry system for a new generation of optical slope measuring profilers,” Nucl. Instrum. Methods A 710, 31–36 (2013). [CrossRef]
  20. F. Siewert, T. Noll, T. Schlegel, T. Zeschke, and H. Lammert, “The nanometer optical component measuring machine: a new sub-nm topography measuring device for x-ray optics at BESSY,” in AIP Conference Proceedings (American Institute of Physics, 2004), pp. 847–850.
  21. F. Siewert, H. Lammert, T. Noll, T. Schlegel, T. Zeschke, T. Hänsel, A. Nickel, A. Schindler, B. Grubert, C. Schlewitt, “Advanced metrology: an essential support fort the surface finishing of high performance x-ray optics,” Proc. SPIE 5921, 592101 (2005). [CrossRef]
  22. http://www.imagine-optic.com/
  23. J. Floriot, X. Levecq, S. Bucourt, M. Thomasset, F. Polack, M. Idir, P. Mercère, T. Moreno, S. Brochet, “A Shack-Hartmann measuring head for the two-dimensional characterization of X-ray mirrors,” J. Synchrotron Radiat. 15(2), 134–139 (2008). [CrossRef] [PubMed]
  24. J. Floriot, X. Levecq, S. Bucourt, M. Thomasset, F. Polack, M. Idir, P. Mercère, S. Brochet, T. Moreno, “Surface metrology with a stitching Shack-Hartmann profilometric head,” Proc. SPIE 6616, 66162A (2007). [CrossRef]
  25. J. Fleig, P. Dumas, P. E. Murphy, G. W. Forbes, “An automated subaperture stitching interferometer workstation for spherical and aspherical surfaces,” Proc. SPIE 5188, 296–307 (2003). [CrossRef]
  26. http://qedmrf.com/metrology/ssi-technology/advantages/advantages-of-stitching
  27. J. H. Burge, C. Zhao, “Applications of subaperture stitching interferometry for very large mirrors,” Proc. SPIE 8450, 84500X (2013).
  28. W. H. Southwell, “Wave front estimation from wave front slope measurements,” J. Opt. Soc. Am. 70(8), 998–1006 (1980). [CrossRef]
  29. http://www.q-sys.eu/indexEN.html
  30. M. Idir, K. Kaznatcheev, S. Qian, R. Conley, “Current status of the NSLS-II optical metrology laboratory,” Nucl. Instrum. Methods Phys. Res. A 710, 17–23 (2013). [CrossRef]
  31. http://www.j-tec.co.jp

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