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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 3 — Feb. 10, 2014
  • pp: 3128–3136

An efficient simulation and analysis method of moiré patterns in display systems

Seok-Joo Byun, Seok Yong Byun, Jangkyo Lee, Won Mok Kim, Han-Pil Kim, Min Yong Jeon, and Taek-Sung Lee  »View Author Affiliations

Optics Express, Vol. 22, Issue 3, pp. 3128-3136 (2014)

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A precise and fast computational method for the simulation and analysis of moiré patterns is proposed. This new algorithm is based on convolution with superposition of the intensity profile which is transmitted from the optical layers and the point spread function. The computational time is shown to be much faster than that of the ray-tracing algorithm because the new algorithm does not involve a massive calculation. Also, information on the moiré pitch can be extracted directly from the sampling data of the moiré patterns.

© 2014 Optical Society of America

OCIS Codes
(120.2040) Instrumentation, measurement, and metrology : Displays
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques
(110.1758) Imaging systems : Computational imaging

ToC Category:
Imaging Systems

Original Manuscript: December 11, 2013
Revised Manuscript: January 22, 2014
Manuscript Accepted: January 26, 2014
Published: February 3, 2014

Seok-Joo Byun, Seok Yong Byun, Jangkyo Lee, Won Mok Kim, Han-Pil Kim, Min Yong Jeon, and Taek-Sung Lee, "An efficient simulation and analysis method of moiré patterns in display systems," Opt. Express 22, 3128-3136 (2014)

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