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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 3 — Feb. 10, 2014
  • pp: 3538–3546

Absolute flatness measurement using oblique incidence setup and an iterative algorithm. A demonstration on synthetic data

Maurizio Vannoni  »View Author Affiliations

Optics Express, Vol. 22, Issue 3, pp. 3538-3546 (2014)

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A method to provide absolute planarity measurements through an interferometric oblique incidence setup and an iterative algorithm is presented. With only three measurements, the calibration of absolute planarity is achieved in a fast and effective manner. Demonstration with synthetic data is provided, and the possible application to very long flat mirrors is pointed out.

© 2014 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.4800) Instrumentation, measurement, and metrology : Optical standards and testing
(120.6650) Instrumentation, measurement, and metrology : Surface measurements, figure

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: November 6, 2013
Revised Manuscript: January 9, 2014
Manuscript Accepted: January 10, 2014
Published: February 6, 2014

Maurizio Vannoni, "Absolute flatness measurement using oblique incidence setup and an iterative algorithm. A demonstration on synthetic data," Opt. Express 22, 3538-3546 (2014)

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