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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 7 — Apr. 7, 2014
  • pp: 7733–7743

Low propagation loss AlGaAs waveguides fabricated with plasma-assisted photoresist reflow

Gyorgy A. Porkolab, Paveen Apiratikul, Bohan Wang, S. H. Guo, and Christopher J. K. Richardson  »View Author Affiliations


Optics Express, Vol. 22, Issue 7, pp. 7733-7743 (2014)
http://dx.doi.org/10.1364/OE.22.007733


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Abstract

We report low-loss deep-etch AlGaAs optical waveguides fabricated with nitrogen plasma-assisted photoresist reflow. The simultaneous application of a nitrogen plasma and heat is used to reduce the line edge roughness of patterned photoresist and limit the lateral spread of the photoresist patterns of submicron-scale waveguides. Comparison of the edge roughness of the etched sidewalls between the as-developed and smoothed photoresist etch samples show a reduction of the RMS roughness from 3.39±0.17 nm to 1.39±0.03 nm. The reduction in propagation loss is verified by measured waveguide loss as a function of waveguide widths. A 0.65-μm wide waveguide with a modal area of 0.4 μm2 is fabricated with a propagation loss as low as 1.20±0.13 dB/cm for the transverse-electric mode.

© 2014 Optical Society of America

OCIS Codes
(230.7370) Optical devices : Waveguides
(290.5880) Scattering : Scattering, rough surfaces

ToC Category:
Optoelectronics

History
Original Manuscript: February 3, 2014
Revised Manuscript: March 13, 2014
Manuscript Accepted: March 16, 2014
Published: March 26, 2014

Citation
Gyorgy A. Porkolab, Paveen Apiratikul, Bohan Wang, S. H. Guo, and Christopher J. K. Richardson, "Low propagation loss AlGaAs waveguides fabricated with plasma-assisted photoresist reflow," Opt. Express 22, 7733-7743 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-7-7733


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