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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 7 — Apr. 7, 2014
  • pp: 8376–8382

Photolithographic patterning at sub-micrometer scale using a three-dimensional soft photo-mask with application on localized surface plasma resonance

Yu-Zen Chen, Chun-Ying Wu, and Yung-Chun Lee  »View Author Affiliations

Optics Express, Vol. 22, Issue 7, pp. 8376-8382 (2014)

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This paper presents a new method for fabricating arrayed metallic nano-structures with sub-micrometer line-widths over large patterning area sizes. It utilizes a soft mold containing arrayed surface micro-pyramids. A carbon-black photo-resist (PR) coating method is developed which can convert the soft mold into a photo-mask. This three-dimensional photo-mask is then applied for photolithographic ultraviolet (UV) patterning. In conjunction with standard metal lift-off process, arrayed metallic nano-structures are formed on glass substrates. A finite element simulation software is used to analyze the underlying mechanism of UV patterning using this new type of 3D photo-mask. The localized surface plasma resonance (LSPR) effects of the fabricated nano-structures are investigated both experimentally and theoretically. Good agreements are observed.

© 2014 Optical Society of America

OCIS Codes
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:

Original Manuscript: February 6, 2014
Revised Manuscript: March 18, 2014
Manuscript Accepted: March 18, 2014
Published: April 1, 2014

Yu-Zen Chen, Chun-Ying Wu, and Yung-Chun Lee, "Photolithographic patterning at sub-micrometer scale using a three-dimensional soft photo-mask with application on localized surface plasma resonance," Opt. Express 22, 8376-8382 (2014)

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