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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 7 — Apr. 7, 2014
  • pp: 8633–8639

Spectral purification and infrared light recycling in extreme ultraviolet lithography sources

Muharrem Bayraktar, Fred A. van Goor, Klaus J. Boller, and Fred Bijkerk  »View Author Affiliations


Optics Express, Vol. 22, Issue 7, pp. 8633-8639 (2014)
http://dx.doi.org/10.1364/OE.22.008633


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Abstract

We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a strong purification of the EUV light, while the reflected IR light becomes refocused into the plasma for enhancing the IR-to-EUV conversion. The dual advantage of EUV purification and conversion enhancement is achieved by incorporating an IR Fresnel zone plate pattern into the EUV reflective multilayer coating of the collector mirror. Calculations using Fresnel-Kirchhoff’s diffraction theory for a typical collector design show that the IR light at the EUV exit is suppressed by four orders of magnitude. Simultaneously, 37% of the reflected IR light is refocused back the plasma.

© 2014 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.3740) Optical design and fabrication : Lithography
(260.3060) Physical optics : Infrared
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(350.5400) Other areas of optics : Plasmas
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Diffraction and Gratings

History
Original Manuscript: January 24, 2014
Revised Manuscript: February 22, 2014
Manuscript Accepted: March 20, 2014
Published: April 3, 2014

Citation
Muharrem Bayraktar, Fred A. van Goor, Klaus J. Boller, and Fred Bijkerk, "Spectral purification and infrared light recycling in extreme ultraviolet lithography sources," Opt. Express 22, 8633-8639 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-7-8633


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