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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 7 — Apr. 7, 2014
  • pp: 8633–8639

Spectral purification and infrared light recycling in extreme ultraviolet lithography sources

Muharrem Bayraktar, Fred A. van Goor, Klaus J. Boller, and Fred Bijkerk  »View Author Affiliations

Optics Express, Vol. 22, Issue 7, pp. 8633-8639 (2014)

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We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a strong purification of the EUV light, while the reflected IR light becomes refocused into the plasma for enhancing the IR-to-EUV conversion. The dual advantage of EUV purification and conversion enhancement is achieved by incorporating an IR Fresnel zone plate pattern into the EUV reflective multilayer coating of the collector mirror. Calculations using Fresnel-Kirchhoff’s diffraction theory for a typical collector design show that the IR light at the EUV exit is suppressed by four orders of magnitude. Simultaneously, 37% of the reflected IR light is refocused back the plasma.

© 2014 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(220.3740) Optical design and fabrication : Lithography
(260.3060) Physical optics : Infrared
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(350.5400) Other areas of optics : Plasmas
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Diffraction and Gratings

Original Manuscript: January 24, 2014
Revised Manuscript: February 22, 2014
Manuscript Accepted: March 20, 2014
Published: April 3, 2014

Muharrem Bayraktar, Fred A. van Goor, Klaus J. Boller, and Fred Bijkerk, "Spectral purification and infrared light recycling in extreme ultraviolet lithography sources," Opt. Express 22, 8633-8639 (2014)

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  1. C. Wagner, N. Harned, “EUV lithography: Lithography gets extreme,” Nat. Photonics 4(1), 24–26 (2010).
  2. G. Tallents, E. Wagenaars, G. Pert, “Optical lithography: Lithography at EUV wavelengths,” Nat. Photonics 4(12), 809–811 (2010).
  3. V. Bakshi, EUV Sources for Lithography, (SPIE Press, Bellingham, WA, 2006).
  4. V. Y. Banine, K. N. Koshelev, G. H. P. M. Swinkels, “Physical processes in EUV sources for microlithography,” J. Phys. D Appl. Phys. 44(25), 253001 (2011).
  5. T. Tomie, ““Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects,” J. Micro-Nanolith,” Mem. 11, 021109 (2012).
  6. G. O’Sullivan, B. Li, ““Development of laser-produced plasma sources for extreme ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021108 (2012).
  7. I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko, ““Development of stable extreme-ultraviolet sources for use in lithography exposure systems,” J. Micro-Nanolith,” Mem. 11, 021110 (2012).
  8. J. Fujimoto, T. Abe, S. Tanaka, T. Ohta, T. Hori, T. Yanagida, H. Nakarai, H. Mizoguchi, ““Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography,” J. Micro-Nanolith,” Mem. 11, 021111 (2012).
  9. R. S. Abhari, B. Rollinger, A. Z. Giovannini, O. Morris, I. Henderson, S. S. Ellwi, ““Laser-produced plasma light source for extreme-ultraviolet lithography applications,” J. Micro-Nanolith,” Mem. 11, 021114 (2012).
  10. V. P. Belik, Y. M. Zadiranov, N. D. Il’inskaya, A. V. Korlyakov, V. V. Luchinin, M. A. Markosov, R. P. Seisyan, E. M. Sher, “Free-standing optical filters for a nanolithography source operating in the 12-15 nm wavelength range,” Tech. Phys. Lett. 33(6), 508–511 (2007).
  11. N. I. Chkhalo, M. N. Drozdov, E. B. Kluenkov, A. Y. Lopatin, V. I. Luchin, N. N. Salashchenko, N. N. Tsybin, L. A. Sjmaenok, V. E. Banine, A. M. Yakunin, “Free-standing spectral purity filters for extreme ultraviolet lithography,”J. Micro. Nanolith. 11(2), 021115 (2012).
  12. C. Mbanaso, A. Antohe, H. Bull, F. Goodwin, A. Hershcovitch, G. Denbeaux, “Out-of-band radiation mitigation at 10.6 mm by molecular absorbers in laser-produced plasma extreme ultraviolet sources,” J. Micro. Nanolith. 11(2), 021116 (2012).
  13. A. J. R. van den Boogaard, E. Louis, F. A. van Goor, F. Bijkerk, “Optical element for full spectral purity from IR-generated EUV light sources,” Proc. SPIE 7271(72713B), 72713B (2009).
  14. A. J. R. van den Boogaard, F. A. van Goor, E. Louis, F. Bijkerk, “Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection,” Opt. Lett. 37(2), 160–162 (2012).
  15. W. A. Soer, M. J. J. Jak, A. M. Yakunin, M. M. J. W. van Herpen, V. Y. Banine, “Grid spectral purity filters for suppression of infrared radiation in laser-produced plasma EUV sources,” Proc. SPIE 7271(72712Y), 72712Y (2009).
  16. W. A. Soer, P. Gawlitza, M. M. J. W. van Herpen, M. J. J. Jak, S. Braun, P. Muys, V. Y. Banine, “Extreme ultraviolet multilayer mirror with near-zero IR reflectance,” Opt. Lett. 34(23), 3680–3682 (2009).
  17. M. M. J. W. van Herpen, R. W. E. van de Kruijs, D. J. W. Klunder, E. Louis, A. E. Yakshin, S. A. van der Westen, F. Bijkerk, V. Banine, “Spectral-purity-enhancing layer for multilayer mirrors,” Opt. Lett. 33(6), 560–562 (2008).
  18. V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, F. Bijkerk, “Infrared suppression by hybrid EUV multilayer--IR etalon structures,” Opt. Lett. 36(17), 3344–3346 (2011).
  19. V. V. Medvedev, A. E. Yakshin, R. W. E. van de Kruijs, V. M. Krivtsun, A. M. Yakunin, K. N. Koshelev, F. Bijkerk, “Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors,” Opt. Lett. 37(7), 1169–1171 (2012).
  20. E. Hecht, Optics, (Addison Wesley, San Francisco, CA, 2002).
  21. A. J. R. van den Boogaard, E. Louis, E. Zoethout, K. A. Goldberg, F. Bijkerk, “Characterization of Mo/Si multilayer growth on stepped topographies,” J. Vac. Sci. Technol. B 29(5), 051803 (2011).
  22. D. L. Voronov, P. Gawlitza, R. Cambie, S. Dhuey, E. M. Gullikson, T. Warwick, S. Braun, V. V. Yashchuk, H. A. Padmore, “Conformal growth of Mo/Si multilayers on grating substrates using collimated ion beam sputtering,” J. Appl. Phys. 111(9), 093521 (2012).
  23. D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. L. Vargas, R. D. Simmons, J. A. Chavez, C. P. Chrobak, “LPP EUV source development for HVM,” Proc. SPIE 6517, 65170Q (2007).
  24. J. Jahns, S. J. Walker, “Two-dimensional array of diffractive microlenses fabricated by thin film deposition,” Appl. Opt. 29(7), 931–936 (1990).

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