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Optics Express

Optics Express

  • Editor: Andrew M. Weiner
  • Vol. 22, Iss. 8 — Apr. 21, 2014
  • pp: 9004–9015

Wavefront metrology measurements at SACLA by means of X-ray grating interferometry

Yves Kayser, Simon Rutishauser, Tetsuo Katayama, Haruhiko Ohashi, Takashi Kameshima, Uwe Flechsig, Makina Yabashi, and Christian David  »View Author Affiliations


Optics Express, Vol. 22, Issue 8, pp. 9004-9015 (2014)
http://dx.doi.org/10.1364/OE.22.009004


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Abstract

The knowledge of the X-ray wavefront is of importance for many experiments at synchrotron sources and hard X-ray free-electron lasers. We will report on metrology measurements performed at the SACLA X-ray Free Electron Laser by means of grating interferometry which allows for an at-wavelength, in-situ, and single-shot characterization of the X-ray wavefront. At SACLA the grating interferometry technique was used for the study of the X-ray optics installed upstream of the end station, two off-set mirror systems and a double crystal monochromator. The excellent quality of the optical components was confirmed by the experimental results. Consequently grating interferometry presents the ability to support further technical progresses in X-ray mirror manufacturing and mounting.

© 2014 Optical Society of America

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(140.2600) Lasers and laser optics : Free-electron lasers (FELs)
(340.0340) X-ray optics : X-ray optics
(340.7450) X-ray optics : X-ray interferometry
(340.7470) X-ray optics : X-ray mirrors

ToC Category:
X-ray Optics

History
Original Manuscript: February 5, 2014
Revised Manuscript: March 26, 2014
Manuscript Accepted: March 30, 2014
Published: April 7, 2014

Citation
Yves Kayser, Simon Rutishauser, Tetsuo Katayama, Haruhiko Ohashi, Takashi Kameshima, Uwe Flechsig, Makina Yabashi, and Christian David, "Wavefront metrology measurements at SACLA by means of X-ray grating interferometry," Opt. Express 22, 9004-9015 (2014)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-22-8-9004


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