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Optics Express

Optics Express

  • Editor: J. H. Eberly
  • Vol. 3, Iss. 10 — Nov. 9, 1998
  • pp: 376–383

Laser modulated scattering as a nondestructive evaluation tool for defect inspection in optical materials for high power laser applications

Z. L. Wu, L. Sheehan, and M. R. Kozlowski  »View Author Affiliations


Optics Express, Vol. 3, Issue 10, pp. 376-383 (1998)
http://dx.doi.org/10.1364/OE.3.000376


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Abstract

Laser modulated scattering (LMS) is introduced as a tool for defect inspection and characterization of optical materials for high power laser applications. LMS is a scatter sensitive version of the well-known photothermal microscopy techniques. Because only the defects of a super-polished optic generate a scattering signal, the technique is essentially a method for dark-field photothermal microscopy. Experimental results show that the technique (1) measures the local absorption properties of defects, contamination, and laser damage sites; (2) when used in conjunction with DC scattering, can differentiate between absorbing and non-absorbing defects; and (3) detects thermal transport inhomogeneities.

© Optical Society of America

OCIS Codes
(120.4290) Instrumentation, measurement, and metrology : Nondestructive testing
(140.3330) Lasers and laser optics : Laser damage
(350.5340) Other areas of optics : Photothermal effects

ToC Category:
Research Papers

History
Original Manuscript: October 2, 1998
Revised Manuscript: August 24, 1998
Published: November 9, 1998

Citation
Zhouling Wu, L. Sheehan, and Mark Kozlowski, "Laser modulated scattering as a nondestructive evaluation tool for defect inspection in optical materials for high power laser applications," Opt. Express 3, 376-383 (1998)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-3-10-376


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References

  1. T. W. Walker, A. H. Guenther, P. Nielsen, "Pulsed laser-induced damage to thin-film optical coatings. II. Theory," IEEE J. Quantum Electron. QE-17, 2053-65 (1981). [CrossRef]
  2. S. Papernov, A. W. Schmid, "Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films," J. Appl. Phys. 82, 5422-32 (1997). [CrossRef]
  3. M. F. Koldunov, A. A. Manenkov, I.L. Pokotilo, "Thermoelastic and ablation mechanisms of laser damage to the surfaces of transparent solids," Quantum Electron. 28, 269-73 (1998). [CrossRef]
  4. R. J. Tench, R. Chow, M. R. Kozlowski, "Characterization of defect geometries in multilayer optical coatings," J. Vac. Sci. & Technol. A 12, 2808-13, (1994). [CrossRef]
  5. S. Papernov, A. W. Schmid, J. Anzelotti, D. Smith, Z. R. Chrzan, "AFM-mapped, nanoscale, absorber-driven laser damage in UV high-reflector multilayers," in Laser-induced damage in optical materials: 1995, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, and M. J. Soileau, ed., Proc. SPIE 2714, 384-94 (1996). [CrossRef]
  6. M. A. Paesler, P. J. Moyer, Near-field optics (John Wiley & Sons, Inc., New York, 1996).
  7. P. A. Temple, "Total internal reflection microscopy: a surface inspection technique," Appl. Opt. 20, 2656-64 (1981). [CrossRef] [PubMed]
  8. L. Sheehan, M. R. Kozlowski, D. Camp, "Application of total internal reflection microscopy for laser damage studies on fused silica," in Laser-induced damage in optical materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, and M. J. Soileau, ed., Proc. SPIE 3244, 282-295 (1998). [CrossRef]
  9. W. B. Jackson, N. M. Amer, A. C. Boccara, D. Fournier, "Photothermal deflection spectroscopy and detection," Appl. Opt. 20, 1333-44 (1981). [CrossRef] [PubMed]
  10. Z. L. Wu, M. Thomsen, P. K. Kuo, C. Stolz, M. R. Kozlowski, "Photothermal characterization of optical thin film coatings," Opt. Eng. 36, 251-262 (1997). [CrossRef]
  11. M. Commandre, P. Roche, "Characterization of optical coatings by photothermal deflection," Appl. Opt. 35, 5021-34 (1996). [CrossRef] [PubMed]
  12. E. Welsch, D. Ristau, "Photothermal measurements on optical thin films," Appl. Opt. 34, 7239-53 (1995). [CrossRef] [PubMed]
  13. B. Woods, M. Yan, J. DeYoreo, M. Kozlowski, H. Radouski, and Z. L. Wu, "Photothermal mapping of defects in the study of bulk damage in KDP," in Laser-induced damage in optical materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, and M. J. Soileau, ed., Proc. SPIE 3244, 242-48 (1998). [CrossRef]
  14. J. Dijon, T. Poiroux, C. Desrumaux, "Nano absorbing centers: a key point in the laser damage of thin films," in Laser-induced damage in optical materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, and M. J. Soileau, ed., Proc. SPIE 2966, 315-25 (1997). [CrossRef]
  15. M. D. Feit, J. Campbell, D. Faux, F. Y. Genin, M. R. Kozlowski, A. M. Robenchik, R. Riddle, A. Salleo, J. Yoshiyama, "Modeling of laser-induced surface cracks in silica at 355 nm," in Laser-induced damage in optical materials: 1997, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, and M. J. Soileau, editors, Proc. SPIE 3244, 350-55 (1998) [CrossRef]
  16. Craig F. Bohren and Donald R. Huffman, Absorption and scattering of light by small particle (John Wiley & Sons, New York, 1983).

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