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Optics Express

Optics Express

  • Editor: J. H. Eberly
  • Vol. 3, Iss. 7 — Sep. 28, 1998
  • pp: 280–285

Energy flow in light-coupling masks for lensless optical lithography

Olivier J. F. Martin, Nicolas B. Piller, Heinz Schmid, Hans Biebuyck, and Bruno Michel  »View Author Affiliations


Optics Express, Vol. 3, Issue 7, pp. 280-285 (1998)
http://dx.doi.org/10.1364/OE.3.000280


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Abstract

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist.

© Optical Society of America

OCIS Codes
(050.1220) Diffraction and gratings : Apertures
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(260.2110) Physical optics : Electromagnetic optics
(290.0290) Scattering : Scattering
(350.3950) Other areas of optics : Micro-optics

ToC Category:
Research Papers

History
Original Manuscript: July 2, 1998
Revised Manuscript: May 20, 1998
Published: September 28, 1998

Citation
Olivier Martin, Nicolas Piller, Heinz Schmid, Hans Biebuyck, and Bruno Michel, "Energy flow in light-coupling masks for lensless optical lithography," Opt. Express 3, 280-285 (1998)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-3-7-280


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References

  1. H. Schmid, H. Biebuck, B. Michel and O.J.F. Martin, "Light-coupling masks for lensless, subwavelength optical lithography," Appl. Phys. Lett. 72, 2379-2381 (1998). [CrossRef]
  2. H. Schmid, H. Biebuck, B. Michel, O. J. F. Martin and N. B. Piller, "Light-coupling masks: an alternative, lensless approach to high-resolution optical contact lithography," J. Vac. Sci. Technol. B in press (1998). [CrossRef]
  3. Special issue on optical lithography, IBM J. Res. Develop. 41(1/2) (1997).
  4. H.A. Biebuyck, N.B. Larsen, E. Delamarche and B. Michel, "Lithography beyond light: microcontact printing with monolayer resists," IBM J. Res. Develop. 41, 159-170 (1997). [CrossRef]
  5. N. B. Piller and O. J. F. Martin, "Increasing the performances of the coupled-dipole approxima- tion: A spectral approach," IEEE Trans. Antennas Propag. 46, 1126-1137 (1998). [CrossRef]
  6. O. J. F. Martin and N. B. Piller, "Electromagnetic scattering in polarizable backgrounds," Phys. Rev. E 58, 3909-3915 (1998). [CrossRef]
  7. Olivier J. F. Martin home page: http://www.ifh.ee.ethz.ch/~martin
  8. IBM Zurich Research Laboratory home page: http://www.zurich.ibm.com

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