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Optics Express

Optics Express

  • Editor: J. H. Eberly
  • Vol. 8, Iss. 11 — May. 21, 2001
  • pp: 611–616

Densification of fused silica due to shock waves and its implications for 351 nm laser induced damage

A. Kubota, M.-J. Caturla, J. S. Stölken, and M. D. Feit  »View Author Affiliations

Optics Express, Vol. 8, Issue 11, pp. 611-616 (2001)

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High-power 351 nm (3ω) laser pulses can produce damaged areas in high quality fused silica optics. Recent experiments have shown the presence of a densified layer at the bottom of damage initiation craters. We have studied the propagation of shock waves through fused silica using large-scale atomistic simulations since such shocks are expected to accompany laser energy deposition. These simulations show that the shocks induce structural transformations in the material that persist long after the shock has dissipated. Values of densification and thickness of densified layer agree with experimental observations. Moreover, our simulations give an atomistic description of the structural changes in the material due to shock waves and their relation to Raman spectra measurements.

© Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(160.6030) Materials : Silica

ToC Category:
Research Papers

Original Manuscript: April 13, 2001
Published: May 21, 2001

A. Kubota, M. -J. Caturla, J. Stolken, and Michael Feit, "Densification of fused silica due to shock waves and its implications for 351 nm laser induced damage," Opt. Express 8, 611-616 (2001)

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