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Optics Express

Optics Express

  • Editor: J. H. Eberly
  • Vol. 8, Iss. 13 — Jun. 18, 2001
  • pp: 682–687

UV light induced surface expansion phenomenon of hybrid glass thin films

J. T. Rantala, A. H. O. Kärkkäinen, J. A. Hiltunen, M. Keränen, T. Kololuoma, and M. R. Descour  »View Author Affiliations

Optics Express, Vol. 8, Issue 13, pp. 682-687 (2001)

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Liquid-phase deposition of sol-gel method derived hybrid glass materials is utilized for fabrication of UV-light-sensitive thin films. The hybrid glass material undergoes a surface-relief deformation when exposed to UV light. The observed deformation phenomenon is in the form of a physical expansion of the exposed areas. The UV light induced surface expansion of the hybrid glass film was used to fabricate near-sinusoidal diffraction gratings with periods of 24 µm, 18 µm, 12 µm, and 9 µm. The maximum deformation when the material was patterned as a diffraction grating was 0.685 µm. The hybrid glass material features an index of refraction of 1.52 at 632.8 nm, rms surface roughness of 2.2±0.8 nm after processing, and extinction coefficients of 1.2×10-3 µm-1 and 0.47×10-3 µm-1 at wavelengths of 633 nm and 1550 nm, respectively.

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OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(160.4670) Materials : Optical materials
(160.6060) Materials : Solgel
(220.3740) Optical design and fabrication : Lithography

ToC Category:
Research Papers

Original Manuscript: April 10, 2001
Published: June 18, 2001

Juha Rantala, Ari Karkkainen, J. Hiltunen, M. Keranen, T. Kololuoma, and Michael Descour, "UV light induced surface expansion phenomenon of hybrid glass thin films," Opt. Express 8, 682-687 (2001)

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