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Optics Express

Optics Express

  • Editor: J. H. Eberly
  • Vol. 9, Iss. 3 — Jul. 30, 2001
  • pp: 121–135

Magnetooptic ellipsometry in multilayers at arbitrary magnetization

Š. Višňovský, R. Lopušník, M. Bauer, J. Bok, J. Fassbender, and B. Hillebrands  »View Author Affiliations


Optics Express, Vol. 9, Issue 3, pp. 121-135 (2001)
http://dx.doi.org/10.1364/OE.9.000121


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Abstract

The Yeh’s 4×4 matrix formalism is applied to determine the electromagnetic wave response in multilayers with arbitrary magnetization. With restriction to magneto–optic (MO) effects linear in the off–diagonal permittivity tensor elements, a simplified characteristic matrix for a magnetic layer is obtained. For a magnetic film–substrate system analytical representations of the MO response expressed in terms of the Jones reflection matrix are provided. These are numerically evaluated for cases when the magnetization develops in three mutually perpendicular planes.

© Optical Society of America

OCIS Codes
(210.3820) Optical data storage : Magneto-optical materials
(240.0310) Optics at surfaces : Thin films
(260.2130) Physical optics : Ellipsometry and polarimetry
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Research Papers

History
Original Manuscript: May 14, 2001
Published: July 30, 2001

Citation
Stefan Visnovsky, Radek Lopusnik, M. Bauer, J. Bok, J. Fassbender, and B. Hillebrands, "Magnetooptic ellipsometry in multilayers at arbitrary magnetization," Opt. Express 9, 121-135 (2001)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-9-3-121


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