1. Introduction
Surface-plasmon-polaritons (SPPs) are waves that propagate along a metal-dielectric interface [
1H. Raether, Surface Plasmons on Smooth and Rough Surfaces and on Gratings (Springer-Verlag, Berlin Heidelberg, 1988).
–
3
E. N. Economu, “Surface plasmons in thin films,” Phys. Rev.
182(2), 539–554 (1969). [CrossRef]
]. As the metal film thickness is sufficiently thin, SPP waves on both sides of the metal are coupled, then long-range surface-plasmon-polariton (LRSPP) propagation occurs [
4
D. Sarid, “Long-range surface-plasma waves on very thin metal films,” Phys. Rev. Lett.
47(26), 1927–1930 (1981). [CrossRef]
–
8
R. Adato and J. Guo, “Characteristics of ultra-long range surface plasmon waves at optical frequencies,” Opt. Express
15(8), 5008–5017 (2007). [CrossRef]
[PubMed]
]. The research on LRSPP propagation provides an important way for manipulating lights in novel sensing applications and other active photonic devices [
9
A. Boltasseva, T. Nikolajsen, K. Leosson, K. Kjaer, M. Larsen, and S. Bozhevolnyi, “Integrated optical components utilizing long-range surface plasmon polaritons,” J. Lightwave Technol.
23(1), 413–422 (2005). [CrossRef]
–
11
G. G. Nenninger, P. Tobiska, J. Homola, and S. S. Yee, “Long-range surface plasmons for high-resolution surface plasmon resonance sensors,” Sens. Act. B
74(1-3), 145–151 (2001). [CrossRef]
]. Sarid proposed the general multilayer device for typical LRSPP propagation [
4
D. Sarid, “Long-range surface-plasma waves on very thin metal films,” Phys. Rev. Lett.
47(26), 1927–1930 (1981). [CrossRef]
]. It is a very thin metal film sandwiched between two dielectric layers with low-refractive-indices in the prism-coupling configuration. The propagation length of the LRSPP wave is increased to 300
at the wavelength of 632.8 nm when a silver film with a thickness of 20 nm is used.
It has been demonstrated that periodically nonhomogeneous sculptured nematic thin films (SNTF) arranged next to a metal film can lead to multiple SPPs excitation including s-polarization and p-polarization states [
12
A. Lakhtakia, Y.-J. Jen, and C.-F. Lin, “Multiple trains of same-color surface plasmon-polaritons guided by the planar interface of a metal and a sculptured nematic thin film. Part III: Experimental evidence,” J. Nanophoton.
3(1), 033506 (2009). [CrossRef]
]. The SNTF acts like a symmetrical film stack that provides a special equivalent admittance in the system to achieve the multiple SPPs. In our previous work, the normalized admittance diagram (NAD) is introduced to assist in designing multilayer structures for the excitation of LRSPP waves of either the p- or the s-polarization state [
13
Y.-J. Jen, A. Lakhtakia, C.-W. Yu, and T.-Y. Chan, “Multilayered structures for p- and s-polarized long-range surface-plasmon-polariton propagation,” J. Opt. Soc. Am. A
26(12), 2600–2606 (2009). [CrossRef]
]. The periodic multilayer structure, comprising symmetrical film stacks with a real or imaginary equivalent admittance, is utilized as a coupling layer, which is inserted between the prism and the metal film. Such a scheme has been applied to excite p- and s-polarized LRSPP modes in a single device.
Consider a p- or s-polarized plane wave that is incident on the planar interface of two semi-infinite media. One is the dielectric medium with a real refractive index
and the other is the medium with a complex refractive index
. Based on an admittance diagram for the design of a thin-film optical filter [
14H. A. Macleod, Thin-Film Optical Filters , 2nd ed. (Adam Hilger, Bristol, 1986).
], the admittances of the two media are
and
, respectively, where
is the permittivity and
is the permeability, of free space. Therefore, the reflection coefficient at the planar interface can be written as
, where
and
θ denote the real-valued angle of incidence and the complex-valued angle of refraction, respectively. If the normalized admittance is defined as
then the reflection coefficient is given by
. As the normalized admittance
η approaches the refractive index
in the NAD, the reflection coefficient goes to zero.
In this work, ultra-long-range surface-plasmon-polariton (SPP) waves for either the p- or the s-polarization state are excited in the configuration {prism/ equivalent coupling layer (ECL) / metal film/ equivalent substrate (ES)}. Three ECL paths are proposed for ultra-long-range SPP propagation at a designated angle of incidence in the NAD. The NAD in Section 2 describes a huge open loop for p- and s-polarized ultra-long-range SPP propagation. Section 3 discusses the three ECL paths and the associated equivalent admittance of the metal film in the NAD. Section 4 addresses the effects of coupling on the excitation of either the p- or the s-polarized ultra-long-range SPP wave for a 20nm-thick silver film at the wavelength of 632.8 nm.
2. Locus of a metal film for ultra-long-range SPP propagation in the NAD
The normalized admittance diagram (NAD) supports the multilayered structure design for ultra-long-range SPP waves in a prism-coupling system {prism/ ECL/ metal film/ ES}. The ECL and the ES are the equivalent coupling layer and the equivalent substrate, respectively, one on each of the two sides of the metal film. The ES is set to provide a positive and imaginary admittance i
γ when total reflection of either the p- or the s-polarization state occurs, as shown in
Fig. 1
. The terminal point
is the intrinsic admittance of a metal film, which is defined as the normalized admittance when the thickness of the film goes to infinity. If the time dependence
is implicit with
w as the angular frequency, then
is given by
where
is the complex refractive index of the metal film;
is the angle of the incidence, and
is the refractive index of the prism.
Fig. 1 Locus of a metal film for ultra-long-range SPP propagation in the NAD.
If the initial imaginary part γ is higher than the imaginary part of the virtual point , then the locus of a metal film is a huge open loop in the NAD. As the thickness of the metal increases, the locus moves toward the terminal point and eventually intersects the real axis of the NAD at a positive value of ξ. A larger initial imaginary part γ is associated with a larger ξ.
Consider the thickness of the metal film,
. Using the transfer admittance matrix [
14H. A. Macleod, Thin-Film Optical Filters , 2nd ed. (Adam Hilger, Bristol, 1986).
], the equivalent admittance
at the end of the metal locus can be expressed as
where
λ,
and
are the wavelength of incidence, refractive index of the prism and the angle of incidence, respectively;
γ is the initial imaginary part associated with the equivalent substrate (ES).
For ultra-long range SPP propagation of either the p- or the s-polarization state, the ECL interposed between the prism and a metal film is used to connect the equivalent admittance of the metal film with the refractive index of the prism in a prism-coupling system {prism/ ECL/ metal film/ ES}, causing a sharp reflection dip in the angular spectrum. The relationship between the refractive index of the prism and the real part of the equivalent admittance determines three ECL paths. The coupling effects of the ECLs are governed by the real part of which can be (i) larger, (ii) equal, or (iii) less than the refractive index of the prism.
Figures 2(a)-(c)
plot the required thickness of the metal film
against the initial imaginary part
γ for the three cases, (i)
, (ii)
, and (iii)
, where
λ is 632.8 nm and
is
which slightly exceeds the total reflection angle at the prism/air interface. The metal is silver with a complex refractive index 0.06656-i4.04520 and the index of
is
. The intrinsic admittance
for p- and s-polarization states are 0.05133-i2.94974 and 0.08602-i5.54748 at
, respectively. The imaginary part
γ should be higher than the imaginary part of
to cause a huge open loop for ultra-long-range SPP propagation in the NAD [
13
Y.-J. Jen, A. Lakhtakia, C.-W. Yu, and T.-Y. Chan, “Multilayered structures for p- and s-polarized long-range surface-plasmon-polariton propagation,” J. Opt. Soc. Am. A
26(12), 2600–2606 (2009). [CrossRef]
]. A larger initial part
γ is associated with a lower thickness of the silver film
. When
γ increases to 20 for the p-polarization state, only
nm is required to yield
which exceeds the refractive index of the prism at
.
Fig. 2 The required thickness of the silver film against the initial part γ for the p-polarization state and the s-polarization state at when (a) , (b) , and (c) . The refractive index of the prism is 1.51511 at nm.
Figure 3
plots large values
ξ against
γ for p- and s-polarization states at
when the wavelength is 632.8 nm. The metal is made of silver. Let
and
be the value
ξ for p- and s-polarization states, respectively. For the p-polarization state, the intrinsic admittance
is 0.05133-i2.94974. The initial imaginary part
γ should be higher than the imaginary part of the virtual point
in order to cause the locus of the silver film to be projected through a large and positive real point
from a purely positive imaginary point i
γ in the NAD. The value
is 9201 when
γ is increased to 20.
Fig. 3 ξ against γ for p- and s-polarization states for a silver film at .The wavelength is 632.8 nm
For the s-polarization state, the intrinsic admittance of the silver film is 0.08602-i5.54748. The initial part γ provided by the ES should be higher than 5.54748, which is the imaginary part of the virtual point of for the excitation of s-polarized ultra-long range SPP waves at . When the initial part γ is increased to 20, becomes a huge value, 22703, which exceeds . Additionally, the values of and both equal to 4780 when γ is at the critical value of 12.50027. When γ is less than 12.50027, is smaller than .
3. Equivalent coupling layer for p- and s-polarized ultra-long-range SPP propagation
As stated in Sec. 2, the locus of a metal film for exciting ultra-long range SPP waves is a huge open loop in the NAD. The equivalent admittance at the end of the loop is determined by the initial imaginary admittance γ that is supplied by the equivalent substrate (ES). For the excitation of either the p- or the s-polarization state in the prism-coupling configuration {prism/ ECL/ metal film/ ES}, the equivalent coupling layer (ECL) with an appropriate intrinsic admittance must be interposed between the metal film and the prism to connect the admittance with the refractive index of the prism , causing a sharp reflection dip in the angular spectrum. For that reason, we proposes three kinds of the ECL paths- (i) clockwise, (ii) near vertical, and (iii) counter-clockwise loci, which are associated with (i) , (ii) , and (iii) , respectively, for ultra-long-range SPP waves in the NAD. The required intrinsic admittance of the ECL is determined by the real part of the equivalent admittance , which is associated with the three coupling paths.
Assume that
is the thickness of the ECL;
λ and
are the wavelength and the angle of incidence, respectively. The required intrinsic admittance
for the p- and s-polarization states is a solution to the equation
If the real part of the equivalent admittance of the metal film is given by
then the real part of
is larger than the refractive index of the prism. As the thickness
increases, the path of the ECL follows a clockwise locus to make the equivalent admittance of the metal film
approach the refractive index
, as shown in
Fig. 4
. The real and positive intrinsic admittance
must be used to establish this relationship in the prism-coupling configuration {prism/ ECL/ metal film/ ES}.If the real part of the equivalent admittance of the metal film is given by
then the real part of
equals to the refractive index of the prism. As the thickness
increases, the path of the ECL approaches a vertical locus and connects the equivalent admittance of the metal film
with the refractive index
, as shown in
Fig. 5
. The intrinsic admittance
with a large and positive imaginary or real part must be used.If the real part of the equivalent admittance of the metal film is given by
then the real part of
is less than the refractive index of the prism. As the thickness
increases, the path of the ECL follows a counter-clockwise locus to connect the equivalent admittance
with the refractive index
, as shown in
Fig. 6
. The intrinsic admittance
with a positive imaginary value must therefore be used.
Fig. 4 Clockwise locus of the equivalent coupling layer for ultra-long-range SPP propagation in the NAD.
Fig. 5 Near vertical locus of the equivalent coupling layer for ultra-long-range SPP propagation in the NAD.
Fig. 6 Counter-clockwise locus of the equivalent coupling layer for ultra-long-range SPP propagation in the NAD.
To achieve the ultra-long range SPP multilayer design, the ECL with the required intrinsic admittance at a designated angle of incidence cannot be produced from an existing bulk material. A symmetrical film stack in which a material with a low-refractive-index is inserted between a pair of materials with high-refractive-indices as the ECL can be employed to realize the three coupling paths in the NAD.
4. Ultra-long-range SPP waves for p- and s-polarization states
Based on the ECL design that is proposed in Sec. 3, ultra-long-range SPP propagation at a designated angle that exceeds the total reflection angle in the prism-coupling system {prism/ ECL/ metal film/ ES} can be excited. Suppose we wish to excite ultra-long range SPP waves for a 20 nm-thick film of silver at an angle of incidence
at
nm. The proper initial imaginary part
γ provided by the ES is required for the ultra-long-range SPP design, as shown in
Fig. 2. The intrinsic admittances of the ECL
can also be determined for the three ECL paths using
Eq. (5).
4.1 Clockwise coupling (p-polarization state)
When , the structure {prism/ ECL () / silver film (20 nm)/ ES ()} is employed to excite the p-polarized ultra-long-range SPP wave at , where the refractive index of the prism is 1.51511 at . The locus of the silver film yields a large contour and the path of the ECL is clockwise in the NAD.
To realize the multilayer design for ultra-long-range SPP propagation, a Ta2O5 layer above the substrate (air) is used as the ES to provide the required initial imaginary part γ. The periodic multilayer structure that comprises the symmetrical film stack [Ta2O5 (λ/8)/SiO2 (λ/4) /Ta2O5 (λ/8)] is used as the ECL to yield the required intrinsic admittance , where a quarter-wavelength-thick SiO2 layer is interposed between a pair of eighth-wavelength-thick Ta2O5 layers. The refractive indices of Ta2O5 and SiO2 are 2.13338 and 1.45705 at nm, respectively.
Figure 7
plots the p-polarization reflectance
as a function of
for the structure {prism/ [Ta
2O
5 (
X*37.077 nm)/SiO
2 (
X*108.58 nm)/Ta
2O
5 (
X*37.077 nm)]
43/ silver film (20 nm)/ [Ta
2O
5 (150.48 nm)/ air]} with a clockwise coupling path at
nm, where
X=1.31496. The required
γ and
are obtained using a {Ta
2O
5 (150.48 nm)/ air} and the periodic multilayer structure [Ta
2O
5 (48.75 nm)/SiO
2 (142.78 nm)/Ta
2O
5 (48.75 nm)] with 43 periods, respectively. The reflection dip occurs at
and the half-width of the reflection dip,
, is
.
Fig. 7 against for the structure {prism/ [Ta2O5 (48.75 nm)/ SiO2 (142.78 nm)/ Ta2O5 (48.75 nm)]43/ silver film (20 nm)/ [Ta2O5 (150.48 nm)/ air]} with a clockwise coupling path at nm.
4.2 Near vertical coupling (p-polarization state)
When , the structure {prism/ ECL () / silver film (20 nm)/ ES ()} is obtained to excite the ultra-long range SPP waves at , where the refractive index of the prism is 1.51511 at nm. The locus of the silver film produces a large contour and the path of the ECL is near vertical in the NAD.
Figure 8
plots
against
for the structure {prism/ [Ta
2O
5 (
X*37.077 nm)/SiO
2 (
X*108.58 nm)/Ta
2O
5 (
X*37.077 nm)]
40/ silver film (20 nm)/ [Ta
2O
5 (150.98 nm)/ air]} with a near vertical coupling locus at
nm, where
X = 1.31461. The required
γ and
are obtained using {Ta
2O
5 (150.98 nm)/ air} and the periodic multilayer structure [Ta
2O
5 (48.74 nm)/SiO
2 (142.74 nm)/Ta
2O
5 (48.74 nm)] with 40 periods, respectively. The reflection dip occurs at
and the half-width of the reflection dip,
, is
.
Fig. 8 against for the structure {prism/ [Ta2O5 (48.74 nm)/ SiO2 (142.73 nm)/ Ta2O5 (48.74 nm)] 40/ silver film (20 nm)/ [Ta2O5 (150.98 nm)/ air]} with a near vertical coupling path at nm.
4.3 Counter-clockwise coupling (p-polarization state)
When , the structure {prism/ ECL () / silver film (20 nm)/ ES ()} is utilized to excite the ultra-long-range SPP waves at , where the refractive index of the prism is 1.51511 at nm. The locus of the silver film generates a large contour and the path of the ECL goes counter-clockwise in the NAD. The equivalent admittance at the end of the metal locus is 0.05133-7.41623i in the NAD. As the thickness of the metal film is increased, the quantities of real and imaginary parts of become smaller. As the thickness of the metal film up to infinity, ends at the point of the intrinsic admittance of silver at at nm.
Figure 9
plots
against
for the structure {prism/ [Ta
2O
5 (
X*37.077 nm)/SiO
2 (
X*108.58 nm)/Ta
2O
5 (
X*37.077 nm)]
28/ silver film (20 nm)/ [Ta
2O
5 (157.86 nm)/ air]} with a counter-clockwise coupling path at
nm, where
X=1.30643. The required
γ and
are obtained using {Ta
2O
5 (157.86 nm)/ air} and the periodic multilayer structure [Ta
2O
5 (48.44 nm)/SiO
2 (141.85 nm)/Ta
2O
5 (48.44 nm)] with 28 periods, respectively. The reflection dip occurs at
and the half-width of the reflection dip,
, is
.
Fig. 9 against for the structure {prism/ [Ta2O5 (48.44 nm)/ SiO2 (141.85 nm)/ Ta2O5 (48.44 nm)] 28/ silver film (20 nm)/ [Ta2O5 (157.86 nm)/ air]} with a counter-clockwise coupling path at nm.
4.4 Propagation lengths of p- and s-polarized ultra-long range SPP waves
The propagation lengths of the ultra-long-range SPP waves in the configuration {prism/ ECL/ silver film (20 nm)/ ES} are calculated using the reflection pole method [
15
E. Anemogiannis, E. N. Glytsis, and T. K. Gaylord, “Determination of guided and leaky modes in lossless and lossy planar multilayer optical waveguides: reflection pole method and wavevector density method,” J. Lightwave Technol.
17(5), 929–941 (1999). [CrossRef]
,
16
J. Guo and R. Adato, “Extended long range plasmon waves in finite thickness metal film and layered dielectric materials,” Opt. Express
14(25), 12409–12418 (2006). [CrossRef]
[PubMed]
]. The guided plasmon wave modes have the complex propagation constants
β and thus effective mode indices
, where
and
λ is the wavelength of incidence.
Table 1
shows the design parameters
γ and
, large values
ξ, effective mode indices
, half-widths
, and propagation lengths
L of the p-polarization state for the three kinds of ECL paths at
at
nm. The periodic multilayer structures [Ta
2O
5/SiO
2/Ta
2O
5] with 43, 40, and 28 periods are used as the ECLs for (i) clockwise, (ii) near vertical, and (iii) counter-clockwise coupling paths, respectively. The refractive indices of Ta
2O
5 and SiO
2 materials are 2.13338 and 1.45705 at
nm, respectively. A Ta
2O
5 layer above the substrate (air) is used as the ES to provide the required initial imaginary part
γ. The thicknesses of the Ta
2O
5 layers used in the cases (i), (ii), and (iii) are 150.48 nm, 150.98 nm, and 157.86 nm, respectively. The reflectance spectra for the three kinds of coupling paths in
Table 1 have been shown previously in
Fig. 7,
Fig. 8, and
Fig. 9. A larger initial value of
γ yields a larger
ξ. The propagation length increases from 1664.43
to 2188.45
as the real part of
declines from 3.03022 to 0.05133. The counter-clockwise path provides the longest propagation length in the multilayer design for p-polarized ultra-long range SPP propagation.
Table 1 Design parameters γ and , real parts of , large values ξ, effective mode indices , half-widths , and propagation lengths L of the p-polarization state for the three types of coupling at and nm.
|
γ
|
|
|
ξ
|
( mode indices) |
(°
) |
L (
) | ECL |
| 4.66291 | 39.92855 | 3.03022 | 435 | 1.000173774-3.0255×0-5i | 0.00306 | 1664.43 | (i) |
| 4.79576 | 116.82044i | 1.51511 | 484 | 1.000173774-2.9585×0-5i | 0.00300 | 1702.10 | (ii) |
| 7.65128 | 7.53359i | 0.05133 | 1872 | 1.000173774-2.3010×0-5i | 0.00233 | 2188.45 | (iii) |
The real parts of the effective mode indices in
Table 1 are equal to 1.000173774. The Ta
2O
5 layer of the ES supplies the required initial part of
γ to the metal/ES interface and supports the enhanced SPP propagation in the multilayer configuration [
16
J. Guo and R. Adato, “Extended long range plasmon waves in finite thickness metal film and layered dielectric materials,” Opt. Express
14(25), 12409–12418 (2006). [CrossRef]
[PubMed]
,
17
F. Y. Kou and T. Tamir, “Range extension of surface plasmons by dielectric layers,” Opt. Lett.
12(5), 367–369 (1987). [CrossRef]
[PubMed]
].
Figure 10(a)
shows the absolute value of the parallel electric field distribution
for the counter-clockwise coupling case at
and
nm. As mentioned in Sec. 2, the huge open loop of the NAD describes a symmetric field distribution with respect to the center of the silver film. The parallel electric filed has an undulating variation that decays away from the metal/ECL interface. None of the modes in
Table 1 is a waveguide mode that the ECL could act as. More energy is located in the Ta
2O
5 layer of the ES. The electric filed diminishes monotonically from the Ta
2O
5/air interface and penetrates far away into air. The reduction of field confinement in the metal acts as a trade-off effect [
18
P. Berini, “Figures of merit for surface plasmon waveguides,” Opt. Express
14(26), 13030–13042 (2006). [CrossRef]
[PubMed]
] to enhance the propagation length.
Fig. 10 The absolute value of the parallel electric field distribution for (a) the p-polarization state and (b) the s-polarization state for the counter-clockwise coupling case in
Table 1 and
Table 2 at
at
nm, respectively.
Three coupling paths are unitized to excite ultra-long-range SPP waves for the s-polarization state in a prism-coupling system {prism/ ECL / silver film (20 nm)/ ES}. An SiO
2 layer above the substrate (air) is used as the ES to provide the required initial imaginary part
γ. The periodic multilayer structure, comprising the symmetrical film stack [Ta
2O
5 (
λ/8)/SiO
2 (
λ/4) /Ta
2O
5 (
λ/8)], is used as the ECL to generate the required intrinsic admittance
.
Table 2
presents the design parameters
γ and
, large values
ξ, effective mode indices
, half-widths
, and propagation lengths
L for the three kinds of ECL paths at
at
nm. The periodic multilayer structures [Ta
2O
5/SiO
2/Ta
2O
5] with 16, 13, and 13 periods are used as the ECLs for (i) clockwise, (ii) near vertical, and (iii) counter-clockwise coupling paths, respectively. The thicknesses of the SiO
2 layer above the substrate (air) are 135.96 nm, 136.39 nm, and 139.87 nm in the cases (i), (ii), and (iii), respectively. The propagation length increases from 2124.05
to 4222.38
as the real part of
changes from 3.03022 to 0.08602. The counter-clockwise path of the ECL is the best for increasing the length of propagation of s-polarized ultra-long-range SPP waves.
Table 2 Design parameters γ and , real parts of , large values ξ, effective mode indices , half-widths , and propagation lengths L of the s-polarization state for the three types of coupling at and nm.
|
γ
|
|
|
ξ
|
( mode indices) |
(°
) |
L (
) | ECL |
| 8.85101 | 64.22461 | 3.03022 | 1208 | 1.000173774-2.3708×0-5i | 0.00238 | 2124.05 | (i) |
| 9.11889 | 116.92408i | 1.51511 | 1379 | 1.000173774-2.0614×0-5i | 0.00210 | 2442.85 | (ii) |
| 12.01175 | 18.00478i | 0.08602 | 4093 | 1.000173774-1.1926×0-5i | 0.00120 | 4222.38 | (iii) |
The real parts of the effective mode indices in the three coupling cases for the s-polarization state are equal to 1.000173774 that is less than the refractive index of a SiO
2 layer of the ES.
Figure 10(b) shows the absolute value of the parallel electric field distribution
for the counter-clockwise ECL path in
Table 2 at
and
nm. The electric field has a symmetric field distribution with respect to the center of the silver film and an undulating variation that decays away from the metal/ECL interface. The energy diminishes monotonically from a maximum at the SiO
2/air interface and penetrates far away into air.
Figure 11
plots the s-polarization reflectance
as a function of
for the structure {prism/ [Ta
2O
5 (157.78 nm)/SiO
2 (53.88 nm)/Ta
2O
5 (157.78 nm)]
13/ silver film (20 nm)/ [SiO
2 (139.87 nm)/ air]} for the counter-clockwise coupling path in
Table 2 at
nm. The reflection dip occurs at
and the half-width of the reflection dip,
, is
.
Fig. 11 as a function of
for the structure {prism/ [Ta
2O
5 (157.78 nm)/SiO
2 (53.88 nm)/Ta
2O
5 (157.78 nm)]
13/ silver film (20 nm)/ [SiO
2 (139.87 nm)/ air]} for the counter-clockwise coupling case in
Table 2. The wavelength is 632.8 nm.