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Energy Express

Energy Express

  • Editor: Bernard Kippelen
  • Vol. 19, Iss. S1 — Jan. 3, 2011
  • pp: A20–A27
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A light-trapping structure based on Bi2O3 nano-islands with highly crystallized sputtered silicon for thin-film solar cells

Qiang Hu, Jian Wang, Yong Zhao, and Dejie Li  »View Author Affiliations


Optics Express, Vol. 19, Issue S1, pp. A20-A27 (2011)
http://dx.doi.org/10.1364/OE.19.000A20


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Abstract

Silicon films with light-trapping structures are fabricated based on Bi2O3 nano-islands, which are obtained by annealing Bi nano-islands in the air at 400°C. The topography exhibits the maximum altitude of over 600nm and the root-mean-square roughness of 150nm, with the lateral size of single island of about 1μm. Highly crystallized sputtered silicon, realized by Cu-induced crystallization, is used to be a light-absorbing layer. Reflectivity of the samples with different thickness of silicon has been studied to reveal the light-trapping efficiency. The average reflectivity under AM1.5 illumination spectrum is 12% when silicon is 480nm thick and the reflectivity for the long wavelength region between 800nm and 1100nm is less than 10% when the silicon is 1.2μm thick. This is a promising low-cost structure for crystallized silicon thin-film solar cells with high efficiency.

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OCIS Codes
(300.1030) Spectroscopy : Absorption
(310.6860) Thin films : Thin films, optical properties
(350.6050) Other areas of optics : Solar energy
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Photovoltaics

History
Original Manuscript: September 27, 2010
Revised Manuscript: November 10, 2010
Manuscript Accepted: November 10, 2010
Published: November 19, 2010

Citation
Qiang Hu, Jian Wang, Yong Zhao, and Dejie Li, "A light-trapping structure based on Bi2O3 nano-islands with highly crystallized sputtered silicon for thin-film solar cells," Opt. Express 19, A20-A27 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-S1-A20


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