4 November 2013, Volume 21, Issue S6, pp. A909-A1139
21 articles
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The authors present an algorithm for generating a surface approximation of microcrystalline silicon (mc-Si) layers after plasma enhanced chemical vapor deposition (PECVD) onto surface textured substrates. Input AZO with textures generated by the algorithm corresponding to simulation results. See K. Hertel, et al., Fig. 9(1) for details.