Three-dimensional holographic lithography by an iterative algorithm

• Abstract

• Optics Letters, Vol. 36, Issue 13, pp. 2495-2497 (July 2011)
• Joshua J. Cowling, Gavin L. Williams, Alan Purvis, Richard McWilliam, Jose J. Toriz-Garcia, Nicholas L. Seed, Florian B. Soulard, Peter A. Ivey

Analytical approach to the impact of polarization aberration on lithographic imaging

• Abstract

• Optics Letters, Vol. 37, Issue 11, pp. 2061-2063 (June 2012)
• Yuanying Tu, Xiangzhao Wang, Sikun Li, Yuting Cao

Advanced mask aligner lithography: new illumination system

• Abstract

• Optics Express, Vol. 18, Issue 20, pp. 20968-20978 (September 2010)
• Reinhard Voelkel, Uwe Vogler, Andreas Bich, Pascal Pernet, Kenneth J. Weible, Michael Hornung, Ralph Zoberbier, Elmar Cullmann, Lorenz Stuerzebecher, Torsten Harzendorf, Uwe D. Zeitner

Impacts of cost functions on inverse lithography patterning

• Abstract

• Optics Express, Vol. 18, Issue 22, pp. 23331-23342 (October 2010)
• Jue-Chin Yu, Peichen Yu

Photonic crystal enhanced fluorescence using a quartz substrate to reduce limits of detection

• Abstract

• Optics Express, Vol. 18, Issue 24, pp. 24793-24808 (November 2010)
• Anusha Pokhriyal, Meng Lu, Vikram Chaudhery, Cheng-Sheng Huang, Stephen Schulz, Brian T. Cunningham

Robust level-set-based inverse lithography

• Abstract

• Optics Express, Vol. 19, Issue 6, pp. 5511-5521 (March 2011)
• Yijiang Shen, Ningning Jia, Ngai Wong, Edmund Y. Lam

In situ aberration measurement technique based on principal component analysis of aerial image

• Abstract

• Optics Express, Vol. 19, Issue 19, pp. 18080-18090 (September 2011)
• Lifeng Duan, Xiangzhao Wang, Anatoly Y. Bourov, Bo Peng, Peng Bu

Pixelated source mask optimization for process robustness in optical lithography

• Abstract

• Optics Express, Vol. 19, Issue 20, pp. 19384-19398 (September 2011)
• Ningning Jia, Edmund Y. Lam

Fast source optimization involving quadratic line-contour objectives for the resist image

• Abstract

• Optics Express, Vol. 20, Issue 7, pp. 8161-8174 (March 2012)
• Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system

• Abstract

• Optics Express, Vol. 20, Issue 15, pp. 16684-16689 (July 2012)
• Hao Wu, Wei Hu, Hua-chao Hu, Xiao-wen Lin, Ge Zhu, Jae-Won Choi, Vladimir Chigrinov, Yan-qing Lu

Hotspot-aware fast source and mask optimization

• Abstract

• Optics Express, Vol. 20, Issue 19, pp. 21792-21804 (September 2012)
• Jia Li, Yijiang Shen, Edmund Y. Lam

Efficient source and mask optimization with augmented Lagrangian methods in optical lithography

• Abstract

• Optics Express, Vol. 21, Issue 7, pp. 8076-8090 (April 2013)
• Jia Li, Shiyuan Liu, Edmund Y. Lam

Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography

• Abstract

• Applied Optics, Vol. 50, Issue 3, pp. 271-281 (January 2011)
• Yasuyuki Unno

Gradual tilting exposure photo and nano lithography technique

• Abstract

• Applied Optics, Vol. 51, Issue 16, pp. 3329-3337 (June 2012)
• Z. Kolahdouz, J. Koohsorkhi, M. A. Cheraghi, M. Saviz, S. Mohajerzadeh

In situ aberration measurement technique based on multi-illumination settings and principal component analysis of aerial images

• Abstract

• Chinese Optics Letters, Vol. 10, Issue 12, pp. 121202-121202 (December 2012)
• Dongbo Xu, Xiangzhao Wang, Yang Bu, Lifeng Duan, Guanyong Yan, Jishuo Yang, Anatoly Y. Burov

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

• Abstract

• Journal of the Optical Society of Korea, Vol. 14, Issue 3, pp. 266-276 (September 2010)
• Dong-Hee Lee

Forming a Fresnel Zone Lens: Effects of Photoresist on Digital-micromirror-device Maskless Lithography with Grayscale Exposure

• Abstract

• Journal of the Optical Society of Korea, Vol. 16, Issue 2, pp. 127-132 (June 2012)
• Yi-Hsiang Huang, Jeng-Ywan Jeng

Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography

• Abstract

• Journal of the Optical Society of Korea, Vol. 16, Issue 3, pp. 221-227 (September 2012)
• Jung-Yu Hur, Man-Seung Seo

Solution processable and photopatternable blue, green and red quantum dots suitable for full color displays devices

• Abstract

• Optical Materials Express, Vol. 2, Issue 5, pp. 519-525 (May 2012)
• Kyung Kook Jang, Prem Prabhakaran, Deepak Chandran, Jong-Jin Park, Kwang-Sup Lee

Quantum dots (QDs) for photonic applications

• Abstract

• Optical Materials Express, Vol. 2, Issue 5, pp. 578-593 (May 2012)
• Prem Prabhakaran, Won Jin Kim, Kwang-Sup Lee, Paras N. Prasad