Performance enhancements to absorbance-modulation optical lithography. I. Plasmonic reflector layers

• Abstract

• JOSA A, Vol. 28, Issue 11, pp. 2209-2217 (November 2011)
• John E. Foulkes, Richard J. Blaikie

Performance enhancements to absorbance-modulation optical lithography. II. Plasmonic superlenses

• Abstract

• JOSA A, Vol. 28, Issue 11, pp. 2218-2225 (November 2011)
• John E. Foulkes, Richard J. Blaikie

Integral equation analysis and optimization of 2D layered nanolithography masks by complex images Green’s function technique in TM polarization

• Abstract

• JOSA A, Vol. 29, Issue 5, pp. 748-756 (May 2012)
• Mohammad Haghtalab, Reza Faraji-Dana

Function of a surface plasmon cavity for enhancing ultradeep subwavelength photolithography

• Abstract

• JOSA B, Vol. 30, Issue 1, pp. 229-232 (January 2013)
• Xu-feng Li, Xia Zhang, Ying-nan Guo, Ji-ke Meng, Ji-lin Wei

Subwavelength imaging enhancement through a three-dimensional plasmon superlens with rough surface

• Abstract

• Optics Letters, Vol. 37, Issue 8, pp. 1295-1297 (April 2012)
• Shaowu Huang, Haogang Wang, Kung-Hau Ding, Leung Tsang

Loss and back-coupling effects on subwavelength imaging of three-dimensional superlens

• Abstract

• Optics Letters, Vol. 37, Issue 12, pp. 2262-2264 (June 2012)
• Haogang Wang, Leung Tsang, Shaowu Huang

Defect-tolerant extreme ultraviolet nanoscale printing

• Abstract

• Optics Letters, Vol. 37, Issue 17, pp. 3633-3635 (September 2012)
• L. Urbanski, A. Isoyan, A. Stein, J. J. Rocca, C. S. Menoni, M. C. Marconi

Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metal

• Abstract

• Optics Express, Vol. 19, Issue 20, pp. 19296-19309 (September 2011)
• Yongwoo Kim, Howon Jung, Seok Kim, Jinhee Jang, Jae Yong Lee, Jae W. Hahn

SPPs coupling induced interference in metal/dielectric multilayer waveguides and its application for plasmonic lithography

• Abstract

• Optics Express, Vol. 20, Issue 11, pp. 12521-12529 (May 2012)
• Peng Zhu, Haofei Shi, L. Jay Guo

Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nano-imprint lithography technique

• Abstract

• Optics Express, Vol. 20, Issue 12, pp. 13091-13099 (June 2012)
• Fei Qin, Zi-Ming Meng, Xiao-Lan Zhong, Ye Liu, Zhi-Yuan Li

Bright and dark helices of light

• Abstract

• Optics Express, Vol. 20, Issue 13, pp. 14371-14379 (June 2012)
• Ole Steuernagel

Actinic microscope for extreme ultraviolet lithography photomask inspection and review

• Abstract

• Optics Express, Vol. 20, Issue 14, pp. 15752-15768 (July 2012)
• Michael Goldstein, Patrick Naulleau

Pattern-Integrated Interference Lithography: Prospects for Nano- and Microelectronics

• Abstract

• Optics Express, Vol. 20, Issue 21, pp. 23643-23652 (October 2012)
• Matthieu C. R. Leibovici, Guy M. Burrow, Thomas K. Gaylord

Optical patterning of features with spacing below the far-field diffraction limit using absorbance modulation

• Abstract

• Optics Express, Vol. 21, Issue 4, pp. 5209-5214 (February 2013)
• Farhana Masid, Trisha L. Andrew, Rajesh Menon

120 nm resolution and 55 nm structure size in STED-lithography

• Abstract

• Optics Express, Vol. 21, Issue 9, pp. 10831-10840 (May 2013)
• Richard Wollhofen, Julia Katzmann, Calin Hrelescu, Jaroslaw Jacak, Thomas A. Klar

Experimental and simulation studies of anti-reflection sub-micron conical structures on a GaAs substrate

• Abstract

• Optics Express, Vol. 21, Issue 101, pp. A36-A41 (January 2013)
• Yeeu-Chang Lee, Che-Chun Chang, Yen-Yu Chou

Gradual tilting exposure photo and nano lithography technique

• Abstract

• Applied Optics, Vol. 51, Issue 16, pp. 3329-3337 (June 2012)
• Z. Kolahdouz, J. Koohsorkhi, M. A. Cheraghi, M. Saviz, S. Mohajerzadeh

Design of interference using coherent beams configured as a six-sided pyramid

• Abstract

• Applied Optics, Vol. 51, Issue 21, pp. 5004-5010 (July 2012)
• Yoshiki Nakata, Keiichi Murakawa, Kenji Sonoda, Kazuma Momoo, Noriaki Miyanaga

Pattern-integrated interference [Invited]

• Abstract

• Applied Optics, Vol. 52, Issue 1, pp. 61-72 (January 2013)
• Thomas K. Gaylord, Matthieu C. R. Leibovici, Guy M. Burrow

Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography

• Abstract

• Applied Optics, Vol. 52, Issue 3, pp. 314-322 (January 2013)
• Monica Kempsell Sears, Joost Bekaert, Bruce W. Smith