Laser-induced damage resistance of thin-film polarizers prepared by ion-assisted deposition
Optics Letters, Vol. 19, Issue 2, pp. 81-83 (1994)
http://dx.doi.org/10.1364/OL.19.000081
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Abstract
An investigation of the effects of ion-assisted deposition on the laser-induced damage threshold of thin-film polarizers has been carried out. It shows that the laser-induced damage threshold of polarizers with 50–100-eV oxygen-ion bombardment during deposition is improved considerably.
© 1994 Optical Society of America
Citation
P. F. Gu and J. F. Tang, "Laser-induced damage resistance of thin-film polarizers prepared by ion-assisted deposition," Opt. Lett. 19, 81-83 (1994)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-19-2-81
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