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Optics Letters

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  • Vol. 21, Iss. 3 — Feb. 1, 1996
  • pp: 174–176

Maskless photoencoded selective etching for glass-based microtechnology applications

Jae H. Kyung and N. M. Lawandy  »View Author Affiliations


Optics Letters, Vol. 21, Issue 3, pp. 174-176 (1996)
http://dx.doi.org/10.1364/OL.21.000174


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Abstract

Two-photon excitation of carriers in boron E′-center-containing borosilicate glasses results in a photoencoding of selectively etchable regions. Using a turbulent etching process followed by polishing, we have demonstrated a number of patterning capabilities for microtechnology applications such as ultrafast capillary electrophoresis chips and rapid prototyping of diffractive optical elements.

© 1996 Optical Society of America

History
Original Manuscript: September 8, 1995
Published: February 1, 1996

Citation
Jae H. Kyung and N. M. Lawandy, "Maskless photoencoded selective etching for glass-based microtechnology applications," Opt. Lett. 21, 174-176 (1996)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-21-3-174


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References

  1. E. Sauvain, J. H. Kyung, N. M. Lawandy, Opt. Lett. 20, 243 (1995). [CrossRef] [PubMed]
  2. D. L. Griscom, G. H. Sigel, R. J. Ginther, J. Appl. Phys. 47, 3 (1976). [CrossRef]
  3. A. T. Woolley, R. A. Mathies, Proc. Natl. Acad. Sci. USA 91, 11348 (1994). [CrossRef] [PubMed]

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