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Optics Letters

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  • Vol. 21, Iss. 7 — Apr. 1, 1996
  • pp: 447–449

Optical intensity mapping on the nanometer scale by near-field photodetection optical microscopy

R. C. Davis, C. C. Williams, and P. Neuzil  »View Author Affiliations


Optics Letters, Vol. 21, Issue 7, pp. 447-449 (1996)
http://dx.doi.org/10.1364/OL.21.000447


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Abstract

Near-field photodetection optical microscopy (NPOM) is a fundamentally new approach to near-field optical microscopy. This scanning-probe technique uses a nanometer-scale photodiode detector as a near-field optical probe. We have fabricated probes for NPOM that have optically sensitive areas as small as 100 nm × 100 nm. These new NPOM probes have been employed to image light transmitted through holes in an aluminum film. Near-surface optical interference is observed near defects and edges of the aluminum film. The optical edge response is shown to be of the order of 100 nm.

© 1996 Optical Society of America

History
Original Manuscript: September 14, 1995
Published: April 1, 1996

Citation
R. C. Davis, P. Neuzil, and C. C. Williams, "Optical intensity mapping on the nanometer scale by near-field photodetection optical microscopy," Opt. Lett. 21, 447-449 (1996)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-21-7-447


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References

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