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Optics Letters

Optics Letters


  • Vol. 24, Iss. 13 — Jul. 1, 1999
  • pp: 863–865

Photochemical processes induced by 157-nm light in H2-impregnated glassy SiO2:OH

Masafumi Mizuguchi, Linards Skuja, *Hideo Hosono, and Tohru Ogawa  »View Author Affiliations

Optics Letters, Vol. 24, Issue 13, pp. 863-865 (1999)

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F2 excimer-laser irradiation induces two major changes in SiO2: OH glass impregnated with H2 molecules. First, the vacuum–UV optical absorption edge is bleached, and the absorption at 157 nm decreases from 0.95 to 0.68 cm-1 . Second, preexisting free SiOH groups and interstitial H2 are photochemically converted to hydrogen-bonded hydroxyl groups. It is suggested that the bleaching of the UV-absorption edge is caused by a change of OH groups from a free to a hydrogen-bonded state and by photolysis of distorted Si—O bonds that are absorbing in the edge region.

© 1999 Optical Society of America

OCIS Codes
(140.0140) Lasers and laser optics : Lasers and laser optics
(140.2180) Lasers and laser optics : Excimer lasers
(140.3330) Lasers and laser optics : Laser damage
(160.6030) Materials : Silica

Masafumi Mizuguchi, Linards Skuja, *Hideo Hosono, and Tohru Ogawa, "Photochemical processes induced by 157-nm light in H2-impregnated glassy SiO2:OH," Opt. Lett. 24, 863-865 (1999)

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