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Optics Letters

Optics Letters


  • Vol. 24, Iss. 19 — Oct. 1, 1999
  • pp: 1352–1354

High photosensitivity and nanometer-scale phase separation in GeO2-SiO2 glass thin films

Hideo Hosono and Junji Nishii  »View Author Affiliations

Optics Letters, Vol. 24, Issue 19, pp. 1352-1354 (1999)

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Amorphous xGeO2–(1-x)SiO2 thin films exhibit large negative index changes (4–8%) in the high GeO2 region (x>~0.25) on irradiation with ArF laser pulses. The sign of the index change is opposite the low GeO2 region X<0.25, and the magnitude of the index change is larger by an order of magnitude than that reported so far. Cross-sectional transmission electron microscope observation has revealed that nanometer-scale phase separation is induced in these highly photosensitive glasses by irradiation with ArF excimer laser light pulses or electron beams. This is a first finding of microphase separation in SiO2–GeO2 glasses by irradiation and provides an essential constraint on the modeling of photonic effects induced by irradiation in these glasses.

© 1999 Optical Society of America

OCIS Codes
(160.2750) Materials : Glass and other amorphous materials
(160.5320) Materials : Photorefractive materials
(310.3840) Thin films : Materials and process characterization
(350.3390) Other areas of optics : Laser materials processing

Hideo Hosono and Junji Nishii, "High photosensitivity and nanometer-scale phase separation in GeO2-SiO2 glass thin films," Opt. Lett. 24, 1352-1354 (1999)

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  1. K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, Appl. Phys. Lett. 32, 647 (1978).
  2. G. Meltz, W. W. Morey, and W. H. Glenn, Opt. Lett. 14, 823 (1989).
  3. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, and J. Albert, Appl. Phys. Lett. 16, 1035 (1993).
  4. H. Hosono, Y. Abe, D. L. Kinser, R. A. Weeks, K. Muta, and H. Kawazoe, Phys. Rev. B 46, 11445 (1992).
  5. D. P. Hand and P. St. J. Russell, Opt. Lett. 15, 102 (1990).
  6. J. Nishii, H. Yamanaka, H. Hosono, and H. Kawazoe, Appl. Phys. Lett. 64, 282 (1994).
  7. V. Mizurahi, P. J. Lamaire, T. Erdogan, W. A. Reed, D. J. DiGiovannii, and R. Atkins, Appl. Phys. Lett. 63, 11, 727 (1993).
  8. K. D. Potter-Simmons, G. I. Stegeman, B. G. Potter, Jr., and J. H. Simmons, Opt. Lett. 18, 25 (1993).
  9. J. Nishii, H. Yamanaka, H. Hosono, and H. Kawazoe, Opt. Lett. 21, 1360 (1996).
  10. O. Becker and K. Bange, Ultramicroscopy 52, 73 (1993).
  11. K. Shimidzu, G. E. Thompson, G. C. Wood, and K. Kobayashi, Philos. Mag. 61, 133 (1990).
  12. H. Hosono, K. Kawamura, H. Kawazoe, and J. Nishii, J. Appl. Phys. 80, 3115 (1996).
  13. J. P. de Neufville and D. Turnbull, Discuss. Faraday Soc. 50, 182 (1970).
  14. B. Malo, J. Albert, K. O. Hill, F. Bilodeau, D. C. Johnson, and S. Theriault, Electron. Lett. 31, 879 (1995).
  15. T. Fujiwara, M. Kakahashi, and A. J. Ikushima, Electron. Lett. 33, 980 (1997).

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