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Optics Letters

| RAPID, SHORT PUBLICATIONS ON THE LATEST IN OPTICAL DISCOVERIES

  • Vol. 24, Iss. 3 — Feb. 1, 1999
  • pp: 124–126

Imaging interferometric lithography: approaching the resolution limits of optics

Xiaolan Chen and S. R. J. Brueck  »View Author Affiliations


Optics Letters, Vol. 24, Issue 3, pp. 124-126 (1999)
http://dx.doi.org/10.1364/OL.24.000124


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Abstract

The resolution limits of conventional optical lithography reflect the low-pass spatial-frequency [numerical aperture (NA) /λ] filter characteristics of the imaging system. Imaging interferometric lithography extends the resolution of optical lithography to the spatial-frequency limits of optics (2/λ) . Off-axis illumination downshifts the high-frequency components of the mask pattern. An interferometric beam at the wafer upshifts these frequency components back to their original spatial frequencies following the lens. 2× reduction imaging interferometric lithography experiments demonstrate a continuous frequency coverage up to ~3N.A./λ with a consequent threefold resolution enhancement.

© 1999 Optical Society of America

OCIS Codes
(070.0070) Fourier optics and signal processing : Fourier optics and signal processing
(110.0110) Imaging systems : Imaging systems
(110.5220) Imaging systems : Photolithography
(220.3740) Optical design and fabrication : Lithography

Citation
Xiaolan Chen and S. R. J. Brueck, "Imaging interferometric lithography: approaching the resolution limits of optics," Opt. Lett. 24, 124-126 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-3-124


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