The resolution limits of conventional optical lithography reflect the low-pass spatial-frequency [numerical aperture (NA) /λ] filter characteristics of the imaging system. Imaging interferometric lithography extends the resolution of optical lithography to the spatial-frequency limits of optics (2/λ) . Off-axis illumination downshifts the high-frequency components of the mask pattern. An interferometric beam at the wafer upshifts these frequency components back to their original spatial frequencies following the lens. 2× reduction imaging interferometric lithography experiments demonstrate a continuous frequency coverage up to ~3N.A./λ with a consequent threefold resolution enhancement.

© 1999 Optical Society of America

[Optical Society of America ]

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

Related Journal Articles

• Can the Wigner transform of a two-dimensional rotationally symmetric beam be fully recovered from the Wigner transform of its one-dimensional approximation? (OL)
• Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region (OL)
• Imaging Profiles of Light Intensity in the Near Field: Applications to Phase-Shift Photolithography (AO)
• Effects of Mo/Si Multilayer Coatings on the Imaging Characteristics of an Extreme-Ultraviolet Lithography System (AO)
• Superresolving Optical System with Time Multiplexing and Computer Decoding (AO)

Related Conference Papers

• Form Factor Enhancement of Imaging Systems Using a Cubic Phase Mask
• Imaging Properties of Three-Dimensional Pupils
• Diffractive Optical Elements Based Fabrication of Photonic Crystal
• Nano-photolithography using a visible light based on the nonadiabatic near-field photochemical reaction
• Imaging Sensors that asks 20 questions: Fulfilling Dr. Healy’s Vision
• Imaging Sensors that asks 20 questions: Fulfilling Dr. Healy’s Vision