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Optics Letters

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  • Vol. 24, Iss. 8 — Apr. 15, 1999
  • pp: 516–518

Arresting ultraviolet-laser damage in fused silica

F. Dahmani, S. J. Burns, J. C. Lambropoulos, S. Papernov, and A. W. Schmid  »View Author Affiliations


Optics Letters, Vol. 24, Issue 8, pp. 516-518 (1999)
http://dx.doi.org/10.1364/OL.24.000516


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Abstract

The 351-nm laser-damage initiation threshold for surface damage in conventionally polished fused silica is demonstrated to be stress dependent. By circumferential application of modest loads to a sample, a controllable stress field can be established within the clear aperture of a fused-silica specimen, in response to which both the damage-initiation fluence and the crack-propagation fluence requirements are increased above those for unstressed conditions.

© 1999 Optical Society of America

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(140.3380) Lasers and laser optics : Laser materials
(140.3390) Lasers and laser optics : Laser materials processing
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(160.4670) Materials : Optical materials
(160.6030) Materials : Silica

Citation
F. Dahmani, S. J. Burns, J. C. Lambropoulos, S. Papernov, and A. W. Schmid, "Arresting ultraviolet-laser damage in fused silica," Opt. Lett. 24, 516-518 (1999)
http://www.opticsinfobase.org/ol/abstract.cfm?URI=ol-24-8-516


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References

  1. F. Dahmani, J. C. Lambropoulos, A. W. Schmid, S. Papernov, and S. J. Burns, J. Mater. Res. 14, 597 (1999).
  2. F. Dahmani, A. W. Schmid, J. C. Lambropoulos, and S. J. Burns, Appl. Opt. 37, 7772 (1998).
  3. ANSYS 5.4 is a finite-element code developed by Ansys, Inc., P.O. BA65, Johnson Road, Houston, Pa., 15342–0065.
  4. N. Boling, M. Crisp, and G. Dube, Appl. Opt. 12, 650 (1973).
  5. H. Yokota, H. Sakata, M. Nishibori, and K. Kinosita, Surf. Sci. 16, 265 (1969).

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